The present work was supported by Academy of Finland (No. 255562).
Atomic Layer Deposition of WO3 Thin Films using W(CO)6 and O3 Precursors†
Article first published online: 14 AUG 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 18, Issue 7-9, pages 245–248, September 2012
How to Cite
Malm, J., Sajavaara, T. and Karppinen, M. (2012), Atomic Layer Deposition of WO3 Thin Films using W(CO)6 and O3 Precursors. Chem. Vap. Deposition, 18: 245–248. doi: 10.1002/cvde.201206986
- Issue published online: 5 SEP 2012
- Article first published online: 14 AUG 2012
- Manuscript Revised: 4 JUN 2012
- Manuscript Received: 22 FEB 2012
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