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Uniformity, Structure, and Photocatalytic Activity of TiO2 Films Deposited by Atmospheric-Pressure Linear Cold Plasma

Authors

  • Lan-Bo Di,

    1. Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering & School of Chemistry, Dalian University of Technology, Dalian 116024 (P. R. China)
    2. College of Physical Science and Technology, Dalian University, Dalian 116622 (P. R. China)
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  • Chuan Shi,

    1. Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering & School of Chemistry, Dalian University of Technology, Dalian 116024 (P. R. China)
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  • Xiao-Song Li,

    1. Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering & School of Chemistry, Dalian University of Technology, Dalian 116024 (P. R. China)
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  • Jing-Lin Liu,

    1. Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering & School of Chemistry, Dalian University of Technology, Dalian 116024 (P. R. China)
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  • Ai-Min Zhu

    Corresponding author
    1. Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering & School of Chemistry, Dalian University of Technology, Dalian 116024 (P. R. China)
    • Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering & School of Chemistry, Dalian University of Technology, Dalian 116024 (P. R. China)
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  • This work was supported by National Natural Science Foundation of China (Grant No 10835004, 51077009) and the Fundamental Research Funds for the Central Universities.

Abstract

Atmospheric-pressure (AP) linear cold plasma CVD is employed to deposit TiO2 photocatalytic films uniformly on a moving substrate. The in-plane and in-depth uniformities of the as-deposited TiO2 films are investigated by scanning electron microscopy (SEM) and UV-vis spectroscopy. The chemical binding states and compositions of the as-deposited TiO2 films are characterized by X-ray photoelectron spectroscopy (XPS). Raman, X-ray diffraction (XRD), and Fourier transform infrared (FTIR) spectra prove the structures of the as-deposited and calcined TiO2 films are mainly hydro-oxygenated amorphous (a-TiOx:OH), and exclusively anatase, respectively. The photocatalytic activity of the as-deposited and calcined TiO2 films is evaluated in a continuous flow reactor for HCHO removal with simulated air. The activity of the as-deposited TiO2 films increases with film thickness, leveling off at about 780 nm. The activity of the as-deposited TiO2 film is lower than that of the calcined one.

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