Financial support from ASM Microchemistry Oy is gratefully acknowledged. The research was also supported by the Finnish Centre of Excellence in Atomic Layer Deposition.
Atomic Layer Deposition of LiF Thin Films from Lithd and TiF4 Precursors†
Article first published online: 14 MAY 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Special Issue: Functional Materials by Atomic Layer Deposition
Volume 19, Issue 4-6, pages 111–116, June 2013
How to Cite
Mäntymäki, M., Hämäläinen, J., Puukilainen, E., Munnik, F., Ritala, M. and Leskelä, M. (2013), Atomic Layer Deposition of LiF Thin Films from Lithd and TiF4 Precursors. Chem. Vap. Deposition, 19: 111–116. doi: 10.1002/cvde.201207026
- Issue published online: 17 JUN 2013
- Article first published online: 14 MAY 2013
- Manuscript Revised: 23 JAN 2013
- Manuscript Received: 16 OCT 2012
- ASM Microchemistry Oy
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