A Micro-pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti-Doping
Article first published online: 16 MAY 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Special Issue: Functional Materials by Atomic Layer Deposition
Volume 19, Issue 4-6, pages 104–110, June 2013
How to Cite
Li, X., Fan, N. C. and Fan, H. J. (2013), A Micro-pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti-Doping. Chem. Vap. Deposition, 19: 104–110. doi: 10.1002/cvde.201207030
- Issue published online: 17 JUN 2013
- Article first published online: 16 MAY 2013
- Manuscript Revised: 12 DEC 2012
- Manuscript Received: 1 NOV 2012
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