The work was supported by NSFC (61076114, 61106108 and 51172046), Shanghai Educational Develop Foundation (10CG04), SRFDP (20100071120027), the Fundamental Research Funds for the Central Universities and the S&T Committee of Shanghai (10520704200).
A Water-free Low Temperature Process for Atomic Layer Deposition of Al2O3 Films†
Article first published online: 16 MAY 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Special Issue: Functional Materials by Atomic Layer Deposition
Volume 19, Issue 4-6, pages 156–160, June 2013
How to Cite
Guo, J.-J., Li, M.-D., Sun, Q.-Q., Yang, W., Zhou, P., Ding, S.-J. and Zhang, D. W. (2013), A Water-free Low Temperature Process for Atomic Layer Deposition of Al2O3 Films. Chem. Vap. Deposition, 19: 156–160. doi: 10.1002/cvde.201207032
- Issue published online: 17 JUN 2013
- Article first published online: 16 MAY 2013
- Manuscript Revised: 27 FEB 2013
- Manuscript Received: 6 NOV 2012
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