This work is supported by NanoNextNL, a micro and nanotechnology programme of the Dutch ministry of economic affairs, agriculture and innovation (EL&I) and 130 partners. Additionally, this work is carried out within the Thin Film Nanomanufacturing (TFN) programme and is supported financially by the Dutch Technology Foundation STW. The authors also thank W. Keuning, C. A. A. van Helvoirt, J. J. L. M. Meulendijks, J. J. A. Zeebregts and M. J. F. van de Sande (all TU/e) for their technical assistance, support and advice.
Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD†
Version of Record online: 16 MAY 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Special Issue: Functional Materials by Atomic Layer Deposition
Volume 19, Issue 4-6, pages 125–133, June 2013
How to Cite
Potts, S. E., Profijt, H. B., Roelofs, R. and Kessels, W. M. M. (2013), Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD. Chem. Vap. Deposition, 19: 125–133. doi: 10.1002/cvde.201207033
- Issue online: 17 JUN 2013
- Version of Record online: 16 MAY 2013
- Manuscript Revised: 11 FEB 2013
- Manuscript Received: 17 NOV 2012
- Dutch Technology Foundation STW
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