Atomic layer deposition (ALD) is traditionally used for deposition of inorganic compounds, metals, organic polymers, and hybrid inorganic/organic materials. In all these materials, the structural framework is based on covalent or metallic bonds. The present paper demonstrates the growth of thin films of metal-organic films in which weak Van der Waals forces are important. Thin films of metal quinolines based on 8-hydroxyquinoline (q) and aluminum (Alq3), zinc (Znq2), and titanium (possibly Tiq4) have been deposited using ALD in the temperature range 85–200 °C. The growth rates decrease with increasing temperature from 0.7–0.4 nm per cycle at 85 °C, to zero at 200 °C. The growth dynamics have been investigated using a quartz crystal microbalance (QCM). It is found that an excess of metal precursor will etch the films. The Alq3 material is stable towards exposure to water during deposition. The photoluminescent properties of selected metal quinoline films are reported.