The research leading to these results has received funding from the European Community's Seventh Framework Programme (FP7/2007-2013) under grant agreement number ENHANCE-238409 and The Austrian Science Fund Project P24093. Authors greatly acknowledge the support of the Center for Micro- and Nanostructures (ZMNS) at Vienna University of Technology.
Electron Beam-Induced CVD of Nanoalloys for Nanoelectronics†
Article first published online: 19 AUG 2014
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Special Issue: Atomic-Scale-Engineered Materials (ASEM)
Volume 20, Issue 7-8-9, pages 251–257, September 2014
How to Cite
Shawrav, M. M., Belić, D., Gavagnin, M., Wachter, S., Schinnerl, M., Wanzenboeck, H. D. and Bertagnolli, E. (2014), Electron Beam-Induced CVD of Nanoalloys for Nanoelectronics. Chem. Vap. Deposition, 20: 251–257. doi: 10.1002/cvde.201407119
- Issue published online: 10 SEP 2014
- Article first published online: 19 AUG 2014
- Manuscript Revised: 13 JUN 2014
- Manuscript Received: 21 FEB 2014
Among various multi-metal combinations, Au-Fe nanoalloys are envisaged as prospective materials for data storage applications. Here we report on the first successful achievement of Au-Fe nanoalloys using focused electron beam-induced deposition (FEBID), exploiting the possibility of directly writing nanostructures at nanometer resolution. Gaseous organometallic precursors are injected simultaneously into the deposition chamber to co-deposit Fe and Au within the same nanostructure. Fabricated nanostructures show a spatially uniform elemental ratio of iron to gold that can be tailored by experimental conditions.