We acknowledge the Excellence Program of the University of Cologne and the financial support provided under the UoC-Forum (MOX-Switch project). This work has been supported in parts by the European Community's 7th Framework Programme (FP7/2007-2013) under Grant ENHANCE-238409.
Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications†
Article first published online: 4 AUG 2014
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Special Issue: Atomic-Scale-Engineered Materials (ASEM)
Volume 20, Issue 7-8-9, pages 291–297, September 2014
How to Cite
Singh, T., Wang, S., Aslam, N., Zhang, H., Hoffmann-Eifert, S. and Mathur, S. (2014), Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications. Chem. Vap. Deposition, 20: 291–297. doi: 10.1002/cvde.201407122
- Issue published online: 10 SEP 2014
- Article first published online: 4 AUG 2014
- Manuscript Revised: 9 JUN 2014
- Manuscript Received: 24 FEB 2014
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