Chemical Vapor Deposition

Cover image for Chemical Vapor Deposition

March, 2004

Volume 10, Issue 2

Pages 55–114

    1. Contents: Chem. Vap. Deposition 2/2004 (pages 55–57)

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200490004

    2. Online Submission of Manuscripts (OSM) (page 59)

      M.L. Hitchman

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200490005

      It is now possible for authors to submit their manuscripts online to CVD. The system provides many advantages for authors and in this editorial Michael Hitchman explains the system and outlines its use.

    3. A Brief Overview of CVD Research at IOPW, Technical University of Braunschweig (pages 61–66)

      J. Arndt, W. Decker, H. Keune, L. Klippe, U. Krause, C. Metz, W. Nemetz, K. Nubian, A. Nürnberg, M. Pulver, S.V. Samoilenkov, J. Schmidt, O. Stadel, D. Stiens, R. Stolle, O.Y. Gorbenko, A.R. Kaul and I.E. Korsakov

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200302009

      In an article dedicated to Professor George Wahl on the occasion of his 65th birthday, an overview is given of CVD research at the Institute of Surface Technology and Plasma Development of Material (IOPW), and of his contributions to that research and to CVD developments over the last 35 years.

    4. Efficient Incorporation of the Ti Component with a Novel Titanium Diolate Complex in the CVD of Ba1–xSrxTiO3 Thin Films (pages 67–69)

      J.S. Lee, S.H. Hong, K. Woo and W.I. Lee

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200304161

      A novel titanium precursor with extended air stability and volatility is demonstrated to facilitate an efficient incorporation of the titanium component for the MOCVD of BST films. In addition to the favourable stability and volatility characteristics, the new white crystalline complex [Ti(mpd)(mdop)(μ-OMe)]2 (Figure) has a thermal decomposition behavior comparable to those of the Ba and Sr precursors used for the deposition BST thin films from a cocktail of the three metal precursors in toluene.

    5. Controlling Surface Composition and Zeta Potential of Chemical Vapor Synthesized Alumina-Silica Nanoparticles (pages 71–76)

      H. Sieger, M. Winterer, H. Mühlenweg, G. Michael and H. Hahn

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200306270

      Ultrafine alumina–silica powders with different composition gradients within the particles have been produced from TEOS and aluminumtrisecbutylate (ASB) in a hot-wall reactor. The surface chemistry at the particle/liquid interface in aqueous dispersions is adjusted by varying the process parameters and the zeta-potential of the powders, which is useful for applications such as chemical mechanical polishing. The isoelectric point of the powders can be controlled in the pH range 2.4 to 9.5. The powders are characterized by various methods including TEM (Figure).

    6. CVD of Epitaxial SnO2 Films by the SnI4/O2 Precursor Combination (pages 77–82)

      J. Sundqvist, M. Ottosson and A. Hårsta

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200306279

      Thin films of SnO2 are successfully deposited on αAl2O3(012) substrates by CVD in the temperature region of 350–700°C using SnI4-O2 precursors . In the temperature range 350–475 °C, the growth rate is found to be controlled by surface kinetics, where it increases exponentially from 5 to 735 nm/h. Two different surface reactions are proposed, one at a low temperature involving SnI4, the other at a high temperature involving SnI2. Above 475 °C the growth rate is controlled by mass transport of tin containing species. Epitaxial relationships for the film/substrate combinations are established. No iodine contamination is detected by X-ray plasmon spectroscopy.

    7. Growth of Praseodymium Oxide and Praseodymium Silicate Thin Films by Liquid Injection MOCVD (pages 83–89)

      H.C. Aspinall, J. Gaskell, P.A. Williams, A.C. Jones, P.R. Chalker, P.A. Marshall, L.M. Smith and G.W. Critchlow

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200306282

      Praseodymium oxide and praseodymium silicate thin films are deposited over a wide temperature range by liquid injection MOCVD in the presence of O2. Pr6O11 is deposited from [Pr(mmp)3] and tetraglyme in toluene. It is postulated that the presence of a large amount of oxygen provided by the [mmp] ligands in the PrIII coordination sphere prevents the deposition of the pure Pr2O3 phase. The deposition of PrSixOy is achieved from [Pr{N9SiMe3)2}3]. SEM analyses indicate that all as-grown films exhibit columnar growth (Figure).

    8. Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water (pages 91–96)

      K. Kukli, M. Ritala, M. Leskelä, T. Sajavaara, J. Keinonen, A.C. Jones and N.L. Tobin

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200306281

      HfO2 films are grown by ALD from a new liquid precursor Hf(ONEt2)4 and water in the temperature range of 250–350 °C. The films, which are grown on Si(100) and borosilicate glass, achieve their highest growth rate at 300 °C and possess an O/Hf ratio of 2.15 ± 0.12 as determined by ion beam analysis. The deposited layers are weakly crystalline, showing XRD peaks characteristic of a monolithic phase. The refractive index of the films varies between 1.93 and 1.96 with effective permittivities of the dielectric layers in Al/HfO2/n-Si(100) capacitor structures close to 10.

    9. Syntheses and Morphologies of Carbon Microsolenoid Composites and Double Negative Microcoils (pages 97–102)

      S. Yang, X. Chen and S. Motojima

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200306274

      Novel carbon microsolenoid composites with central straight nanopores (Figure) and double negative coils are prepared by a two step CVD process using carbon microcoil (CMC) templates. The regular carbon microcoils without a coil gap are grown over Ni-containing alloy catalysts. The temperature is then raised to facilitate the in-situ coating of pyrolytic-C layers on the carbon microcoil template surface to form carbon microsolenoid composites. Negative carbon microcoils are formed by the partial oxidation of the microsolenoids.

    10. Improvement of Selectivity in Specific Adsorption by the Addition of Acetic Acid during the CVD of Silicon Alkoxide to Form a Silica Overlayer with a Molecular Sieving Property (pages 103–107)

      N. Katada, S. Akazawa and M. Niwa

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200306278

      CVD of silicon alkoxide is carried out on a tin oxide surface with pre-adsorbed carboxylate anions acting as a template. The deposition of tetamethoxysilane occurs at 473 K, at which temperature the Sn–O–Si bond is easily formed. The formation of the siloxane is accelerated by adding acetic acid during the deposition. The removal of the template and acetic acid results in a tendency to adsorb only small molecules and almost complete suppression of the absorption of large molecules. A shape selective adsorption capacity is thus observed, and it is suggested that shape and size are controlled by the template molecule.

    11. MOCVD of LaMnO3 on Biaxially Textured Ni-based Substrates in a Reducing Atmosphere (pages 109–113)

      O.Y. Gorbenko, O. Stadel, G. Wahl and A.R. Kaul

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200306259

      In-situ deposition of perovskite manganites is carried out on biaxially textured Ni-based metal tapes at 800–850°C using a modified MOCVD process. The modification is achieved by the addition of ammonia and water to prevent the oxidation of Ni and the reduction of the manganites into non-perovskite phases. Orthorhombic LaMnO3 films (figure) demonstrate (101) orientation, minimizing lattice mismatch with the Ni, suggesting its suitability as a buffer layer for high current applications of high-Tc superconductors.

    12. Author Index and Subject Index Chem. Vap. Deposition 2/2004 (page 114)

      Article first published online: 23 MAR 2004 | DOI: 10.1002/cvde.200490003