Chemical Vapor Deposition

Cover image for Chemical Vapor Deposition

Special Issue: Atmospheric Pressure Plasma Enhanced CVD (AP-PECVD)

December, 2005

Volume 11, Issue 11-12

Pages 451–530

    1. Contents: Chem. Vap. Deposition 11-12/2005 (pages 451–453)

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200590020

    2. Editorial: Atmospheric Pressure Plasma Enhanced CVD (page 455)

      M. L. Hitchman

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200590021

    3. Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non-thermal Non-equilibrium Plasmas (pages 457–468)

      S. E. Alexandrov and M. L. Hitchman

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200500026

      AP-PECVD can provide simple, cost effective layer deposition. This review considers sources of non-thermal plasmas and discusses applications of dielectric barrier discharges, RF planar and torch (see Figure) reactors, corona discharges, and microwave systems. It is concluded that there is the potential for a wide range of commercial applications.

    4. Atmospheric Plasma Deposition of Coatings Using a Capacitive Discharge Source (pages 469–476)

      M. Moravej and R. F. Hicks

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200400022

      In this manuscript, a review is provided of atmospheric pressure PECVD of thin films using a capacitively coupled plasma source. The organometallic precursors are fed downstream of the plasma, where reactions occur exclusively between neutral molecules, radicals, and the substrate surface. As a result, the properties of the films are different than those obtained in low-pressure gas discharges (<1 torr).

    5. Atmospheric Pressure Plasma Liquid Deposition – A Novel Route to Barrier Coatings (pages 477–479)

      L. O'Neill, L.-A. O'Hare, S. R. Leadley and A. J. Goodwin

      Article first published online: 14 DEC 2005 | DOI: 10.1002/cvde.200404209

      A novel path to barrier deposition at atmospheric pressure. By injecting liquid silicones into a non-equilibrium atmospheric pressure plasma, a variety of silica coatings have been deposited. The reactivity of the precursor was found to control the reaction dynamics and powder free coatings were deposited under selected conditions. The resultant coatings provided significant reductions in oxygen transmission rates on plastic substrates.

    6. Remote AP-PECVD of Silicon Dioxide Films from Hexamethyldisiloxane (HMDSO) (pages 481–490)

      S. E. Alexandrov, N. McSporran and M. L. Hitchman

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200506385

      A very simple atmospheric pressure (AP)-PECVD process based on dielectric barrier discharge is described. In this particular work, the effect of a range of deposition parameters on the properties of silicon dioxide grown from HMDSO-O2-Ar has been investigated. Layer properties comparable to those obtained by more conventional CVD processes can be achieved, and general optimum conditions for good quality films can be derived from the specific results.

    7. Aerosol-Assisted Plasma Deposition of Barrier Coatings using Organic-Inorganic Sol-Gel Precursor Systems (pages 491–496)

      D. Vangeneugden, S. Paulussen, O. Goossens, R. Rego and K. Rose

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200406345

      Hybrid organic-inorganic precursors and sol-gel systems thereof, obtained via wet-chemical hydrolysis, were atomised and introduced in an atmospheric pressure dielectric barrier discharge (DBD) in nitrogen. Plasma assisted coating deposition of the sol-gel systems proved to be superior to wet-chemical application and conventional thermal or UV curing. The best barrier performance was obtained with a coating from a new non-hydrolysed high molecular weight siloxane precursor, Bayrecit.

    8. Remote Microwave PECVD for Continuous, Wide-Area Coating Under Atmospheric Pressure (pages 497–509)

      V. Hopfe, R. Spitzl, I. Dani, G. Maeder, L. Roch, D. Rogler, B. Leupolt and B. Schoeneich

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200406352

      Microwave PECVD technology has been extended to atmospheric pressure operation. A cylinder type microwave cavity was scaled-up to different working diameters. The half-meter range already has been achieved and further scale-up potential could be demonstrated. Silica layers were deposited on stainless steel and glass. Deposition rates were in the range of 15 – 100 nm/s (static) and 0.3 – 2.0 nm m s–1 (dynamic). Layer properties were determined by spectroscopic-ellipsometry and FTIR reflectance spectroscopy, elastic recoil detection analysis, and nano-indentation. The optical properties and the network structure of the silica layers are close to bulk silica.

    9. Linear Extended ArcJet-CVD – a New PECVD Approach for Continuous Wide Area Coating Under Atmospheric Pressure (pages 510–522)

      V. Hopfe, D. Rogler, G. Maeder, I. Dani, K. Landes, E. Theophile, M. Dzulko, C. Rohrer and C. Reichhold

      Article first published online: 12 DEC 2005 | DOI: 10.1002/cvde.200406343

      A new type of a DC powered plasma source (LARGE) was developed and was evaluated for continuous PECVD at atmospheric pressure. The reactor operates in a remote AP-PECVD configuration with typical deposition rates of 5–50 nm/s (static) and 0.1–1.0 nm m/s (dynamic). The potential application range of the ArcJet-CVD technology was evaluated for different coating materials (silica, carbon, silicon nitride). In-situ process characterisation has been provided by both optical emission and FTIR spectroscopy.

    10. Author Index Chem. Vap. Deposition 2005 (pages 525–526)

      Article first published online: 14 DEC 2005 | DOI: 10.1002/cvde.200590023

    11. Subject Index Chem. Vap. Deposition 2005 (pages 527–530)

      Article first published online: 14 DEC 2005 | DOI: 10.1002/cvde.200590024