G. Carta, M. Natali, G. Rossetto, P. Zanella, G. Salmaso, S. Restello, V. Rigato, S. Kaciulis and A. Mezzi
Cr2O3 thin films can grown by MOCVD on stainless steel, soda-lime glass, and (001) silicon substrates using three different organochromium compounds, allowing comparison between their structural, morphological, and chemical compositions. The films were analyzed by XRD, AFM, Rutherford backscattering, nuclear reaction analysis, elastic recoil detection, XPS, and FTIR spectroscopy. All films were crystalline with hexagonal Cr2O3 eskalonite structure. The films grown from Cr(CO)6, which possess the highest growth rate, were carefully analyzed by nanoindentation mesurements.