Chemical Vapor Deposition

Cover image for Chemical Vapor Deposition

Special Issue: Aerosol-Assisted CVD

October, 2006

Volume 12, Issue 10

Pages 577–637

Issue edited by: Kwang-Leong Choy

  1. Contents

    1. Top of page
    2. Contents
    3. Guest Editorial
    4. Review
    5. Communication
    6. Full Papers
    7. Index
    1. Contents: Chem. Vap. Deposition 10/2006 (pages 577–579)

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200690020

  2. Guest Editorial

    1. Top of page
    2. Contents
    3. Guest Editorial
    4. Review
    5. Communication
    6. Full Papers
    7. Index
    1. Special Issue on Aerosol-Assisted Chemical Vapor Deposition (pages 581–582)

      Kwang-Leong Choy

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200690021

  3. Review

    1. Top of page
    2. Contents
    3. Guest Editorial
    4. Review
    5. Communication
    6. Full Papers
    7. Index
    1. Processing and Applications of Aerosol-Assisted Chemical Vapor Deposition (pages 583–596)

      X. Hou and K.-L. Choy

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200600033

      A brief review is presented to highlight the recent progress in aerosol-assisted CVD (AACVD). As a variant of conventional CVD, AACVD offers a flexible and cost-effective deposition method, and an alternative solution to the availability and delivery problems of the chemical precursors in CVD process. The review covers the processing principle, variants of AACVD, applications, and an outlook for research and development in this area.

  4. Communication

    1. Top of page
    2. Contents
    3. Guest Editorial
    4. Review
    5. Communication
    6. Full Papers
    7. Index
    1. Studies of Molybdenum Disulfide Nanostructures Prepared by AACVD Using Single-Source Precursors (pages 597–599)

      A. Adeogun, M. Afzaal and P. O'Brien

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200504203

      Nanostructures of hexagonal MoS2 thin films synthesized using air-stable, single-source molecular precursors of molybdenum dithiocarbamates are reported. On increasing the length of the substituent alkyl groups of the precursor, changes in the type of structures grown under similar growth conditions can be observed (see figure, scales 50 nm).

  5. Full Papers

    1. Top of page
    2. Contents
    3. Guest Editorial
    4. Review
    5. Communication
    6. Full Papers
    7. Index
    1. Aerosol-Assisted CVD of Antimony Sulfide from Antimony Dithiocarbamates (pages 601–607)

      J. Rodriguez-Castro, M. F. Mahon and K. C. Molloy

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200506369

      Three new antimony dithiocarbamates with asymmetric substitution, Sb[S2CN(Me)R]3 (R = Bu, Hex, Bz), have been synthesized and characterized. At 395 °C, Sb[S2CN(Me)Bz]3 acts as an AACVD precursor to deposit Sb2S3 with a needle morphology. At higher temperatures, oxygen incorporation into the films becomes evident.

      Corrected by:

      Correction: Aerosol-Assisted CVD of Antimony Sulfide from Antimony Dithiocarbamates

      Vol. 12, Issue 12, 706, Article first published online: 19 DEC 2006

    2. Transparent Conductive Thin Films of Sn Doped In2O3 Grown by Aerosol-Assisted CVD Using InIII Acetylacetonate with 5 mol % SnIV Bis-acetylacetonate Dibromide Dissolved in Acetylacetone (pages 608–613)

      A. Suzuki and K. Maki

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200506379

      Transparent, conductive thin films on tin-doped indium oxide have been deposited onto heated glass substrates using an aerosol generated by the ultrasonic oscillation of a precursor solution amd supplied through two furnaces. The electrical resistivity, the carrier concentration, the Hall mobility, and the optical bandgap are determined as functions of the film thickness.

    3. Thermal Stability of Flame-Made Zirconia-Based Mixed Oxides (pages 614–619)

      R. Jossen, M. C. Heine, S. E. Pratsinis and M. K. Akhtar

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200506380

      The thermal stability of pure and doped zirconia fabricated by flame-spray pyrolysis is studied by calcination at various temperatures and residence times. Powders are analyzed by X-ray diffraction, nitrogen adsorption, energy-dispersive X-ray spectroscopy, and transmission electron microscopy. The metastable tetragonal structure of flame-made ZrO2 transformed to monoclinic phase after sintering. Doping zirconia with yttria, ceria, lanthanum oxide, alumina, or silica increased the thermal stability and also hindered phase transformation.

    4. Deposition of Ni and Pd Sulfide Thin Films via Aerosol-Assisted CVD (pages 620–626)

      P. O'Brien and J. Waters

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200506387

      Thin films of nickel sulfide and palladium sulfide have been prepared by aerosol-assisted chemical vapor deposition using dithiocarbamate precursors, of the type M(S2CNRR')2 (M = Ni, Pd; RR' = Et2, MeEt, MenBu or MenHex). The solid-state structure of Ni(S2CNMenBu)2, was determined by X-ray single-crystal diffraction and is characteristic of known nickel dithiocarbamates.

    5. Jet-Assisted Aerosol CVD for Multicomponent Particle Deposition (pages 627–630)

      C. Hong, D. S. Kim and M. Choi

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200506402

      Aerosol CVD has been extensively utilized to manufacture high-quality optical fibers in which multicomponent aerosols are generated and deposited. This method is applied to the deposition of multicomponent particles and is demonstrated not only to significantly improve overall particle-deposition efficiency, but also to enhance the uniformity of composition of multicomponent SiO2/GeO2 particle deposition.

    6. Crystal Growth of ZnS Films by a Charged Aerosol-Assisted Vapor Deposition Process (pages 631–636)

      X. Hou and K.-L. Choy

      Article first published online: 16 OCT 2006 | DOI: 10.1002/cvde.200506403

      Hexagonal ZnS films are produced from charged aerosol droplets using electrostatic assisted aerosol jet deposition. Control of droplet charge ratio is one of the important factors for controlling the nucleation and crystal growth of ZnS films. Appropriate droplets charge density can enhance the crystallinity and preferred growth orientation of the hexagonal ZnS structure. Increasing droplet charge ratio decreases the crystallite size of the deposited hexagonal structure, while more ZnO forms, decreasing the optical bandgap of ZnS films.

  6. Index

    1. Top of page
    2. Contents
    3. Guest Editorial
    4. Review
    5. Communication
    6. Full Papers
    7. Index

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