Chemical Vapor Deposition

Cover image for Vol. 13 Issue 1

January, 2007

Volume 13, Issue 1

Pages 3–61

  1. Cover Picture

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Editorial
    6. Communications
    7. Full Papers
    8. Index
  2. Contents

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Editorial
    6. Communications
    7. Full Papers
    8. Index
  3. Guide for Authors

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Editorial
    6. Communications
    7. Full Papers
    8. Index
  4. Editorial

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Editorial
    6. Communications
    7. Full Papers
    8. Index
    1. A Passion for Publishing (pages 9–12)

      Michael L. Hitchman

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200790004

  5. Communications

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Editorial
    6. Communications
    7. Full Papers
    8. Index
    1. The Preparation of Diamond/Tungsten- Carbide Composite Films by Microwave Plasma-Assisted CVD (pages 17–20)

      H. A. Samra, R. Hong and X. Jiang

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200604225

      Diamond/tungsten carbide composite films are deposited on Si and W by microwave plasma-assisted CVD using a CH4/H2/WCl6 gas mixture. The composite films are studied by SEM, laser Raman scattering and X-ray diffraction. The film composition and morphology can be adjusted by controlling the concentration of WCl6 in the gas mixture. Such a diamond-based composite film can serve as an interlayer to improve the adhesion of diamond films.

    2. Highly Ordered Macroporous Gold Film Formed by CVD Using Monodisperse Polystyrene Spheres as Templates (pages 20–22)

      R. H. W. Au and R. J. Puddephatt

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200604227

      Macroporous gold films have been prepared by chemical vapor deposition using polystyrene spheres as templates. The gold films are prepared by using the CVD precursor complex [AuMe(PMe3)]. In order to effect the CVD at low temperature, the polystyrene spheres are seeded with palladium metal, in order to catalyze the decomposition of the gold precursor complex.

  6. Full Papers

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Editorial
    6. Communications
    7. Full Papers
    8. Index
    1. CVD-Fabricated Aluminum Oxide Coatings from Aluminum tri-iso-propoxide: Correlation Between Processing Conditions and Composition (pages 23–29)

      A. N. Gleizes, C. Vahlas, M.-M. Sovar, D. Samélor and M.-C. Lafont

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200606532

      The preparation of thin films of alumina by LP-MOCVD from aluminium tri-iso-propoxide as a precursor in an inert atmosphere is revisited in the temperature range 350–700 °C. The films are analyzed and characterized using various spectroscopy and microscopy techniques, and the compositions are correlated to their processing conditions.

    2. Behavior of Ni-Doped MgMoO4 Single-Phase Catalysts for Synthesis of Multiwalled Carbon Nanotube Bundles (pages 30–36)

      Y. Li, X. Zhang, H. J. Geise and G. van Tendeloo

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200606531

      Nickel-doped MgMoO4 single-phase catalysts can be used to synthesize multiwalled carbon nanotubes. This paper reports the effect of various ratios of CH4/H2 and CH4/N2 on the doped catalysts. Hydrogen plays an important role during the reaction process. A new phase of NiMoO4 formed after nickel atoms replace the magnesium atoms in MgMoO4 may explain the high yield of nanotubes. A formation mechanism is proposed based on the results.

    3. The Synthesis of ZrO2/SiO2 Nanocomposites by the Two-Step CVD of a Volatile Halogen-Free Zr Alkoxide in a Fluidized-Bed Reactor (pages 37–41)

      W. Xia, Y. Wang, V. Hagen, A. Heel, G. Kasper, U. Patil, A. Devi and M. Muhler

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200606533

      Highly dispersed zirconia is deposited on silica by metal–organic CVD of a Zr alkoxide precursor. The high degree of dispersion, as indicated by the XRD, TEM, XPS, and diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS) results, can be attributed to a strong interaction between the zirconia species and the support. The obtained zirconia/silica nanocomposites maintain high Brunauer–Emmett–Teller surface areas, which are essential for heterogeneous catalysis.

    4. Phase-Selective CVD of Vanadium Oxide Nanostructures (pages 42–47)

      S. Mathur, T. Ruegamer and I. Grobelsek

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200606578

      Nanostructured vanadium oxide thin films are deposited by chemical vapor deposition of a single molecular precursor vanadium oxo-tri-isopropoxide containing pre-defined V-O and V=O units. Subject to deposition temperature, different V/O stoichiometries and phase compositions (V2O5, V7O13 and VO2) were reproducibly obtained. Adjustment of process parameters allowed phase-selective deposition of VO2 films, which were investigated towards thermochromic phase-transition, structural and electrical properties.

    5. Deposition of Palladium Nanodots of Controlled Size and Density onto Surface-Modified SiO2 Particles by an Atmospheric Pressure CVS/MOCVD Process (pages 48–54)

      A. Binder, A. Heel and G. Kasper

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200606543

      SiO2-supported Pd catalyst particles are generated in a continuous gas phase process operating at atmospheric pressure. First, carrier particles with defined surface conditions are generated online by CVS of tetraethyl(ortho)silicate (TEOS); then Pd is deposited by MOCVD of Cp(allyl)Pd. Nanodot diameters (1.2–3 nm) and number densities on the carrier particle surface (0–12 per 100 nm2) are narrowly controlled via precursor vapor concentration and concentration of surface hydroxyl groups, respectively.

    6. Thermomechanical Properties of Parylene X, A Room-Temperature Chemical Vapor Depositable Crosslinkable Polymer (pages 55–59)

      J. J. Senkevich, B. W. Woods, J. J. McMahon and P.-I Wang

      Version of Record online: 16 JAN 2007 | DOI: 10.1002/cvde.200606541

      The addition of the ethynyl moiety to cyclophane chemistry allows for the deposition of a parylene polymer with robust thermomechanical properties after the ethynyl groups crosslink. In particular, the films exhibit a thermal stability to 420 °C without weight loss, a low coefficient of thermal expansion of 55 ppm/°C, a high hardness of 0.96 GPa, and a low stress state.

  7. Index

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Editorial
    6. Communications
    7. Full Papers
    8. Index

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