Chemical Vapor Deposition

Cover image for Vol. 14 Issue 1‐2

February, 2008

Volume 14, Issue 1-2

Pages 3–57

  1. Cover Picture

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Full Papers
    6. Index
  2. Contents

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Full Papers
    6. Index
    1. Contents: Chem. Vap. Deposition 1-2/2008 (pages 3–5)

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200890001

  3. Guide for Authors

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Full Papers
    6. Index
    1. Guide for Authors Chem. Vap. Deposition 1-2/2008 (pages 6–7)

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200890003

  4. Full Papers

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Full Papers
    6. Index
    1. The Influence of In/Cu Ratio on Electrical Properties of CuO:In Thin Films Prepared by Plasma-Enhanced CVD (pages 9–13)

      Y. Hao and H. Gong

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200706645

      CuO:In thin films were prepared by plasma-enhanced chemical vapor deposition (CVD) with Cu(acac)2 and In-(acac)3 precursors. A unique home-built solid-state precursor sublimation and transportation system of the CVD system was described. A structural evolution from nano-crystalline characteristic to amorphous state was found as the In/Cu atomic ratio of the mixed precursors increased from 0 to 0.25. X-ray photoelectron spectroscopy (XPS) was employed to study the dependence of the resistivity of the films on the indium concentration.

    2. Controlled Nanostructured Silver Coated Surfaces by Atmospheric Pressure Chemical Vapour Deposition (pages 14–24)

      D. W. Sheel, L. A. Brook and H. M. Yates

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200706654

      A combination of Flame Assisted Chemical Vapour Deposition at atmospheric pressure, with low cost and a low toxicity silver precursor (aqueous silver nitrate), was used to generate coatings of structured silver surfaces. This approach gives a high degree of control of surface structure, density and topography. Results indicate very high biocidal activity where the nano-structure is proposed as playing a significant role.

    3. Characterization of SiO2 Deposited by CVD on MoxOy/Al2O3 using NMR and TOF-SIMS (pages 25–32)

      K. A. Boateng and J. M. Hill

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200706642

      Silica (SiO2) was deposited onto the surface of MoxOy/Al2O3 using FBCVD. The resulting deposit was characterized using N2 physisorption, ICP, 29Si NMR and ToF-SIMS. The amount deposited on the surface reached a plateau value after 30 – 60 minutes. This plateau value corresponded to 2–3 monolayers. The surface coverage was not uniform and the presence of Mo on the exterior surface of Al2O3 hindered the deposition of silica.

    4. Hybrid Aerosol Assisted and Atmospheric Pressure CVD of Gold-Doped Vanadium Dioxide (pages 33–39)

      R. Binions, C. Piccirillo, R. G. Palgrave and I. P. Parkin

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200706641

      Hybrid aerosol assisted and atmospheric pressure chemical vapor deposition methodology has been utilized, for the first time, to produce thin films of gold nano-particle doped vanadium dioxide. Good surface coverage is observed comparable to that of APCVD processes and a variety of different film thicknesses and dopant levels have been made easily. Incorporation of gold nanoparticles in the films leads to significant changes in the color of the film due to the presence of a surface plasmon resonance band.

    5. The Preparation and CVD Densification of Multi-walled Carbon Nanotube Felt Synthesized by a Catalytic CVD Method (pages 40–45)

      X. Li, G. Yuan, A. Westwood, H. Zhang, Z. Dong, A. Brown, R. Brydson and B. Rand

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200706634

      Multiwalled carbon nanotube (MWCNT) felts are prepared by catalytic decomposition of methane over an aerogel catalyst. The graphitized MWCNT felts are then densified in a CVD furnace. The morphology and the structure of the MWCNT felt and its CVD-densified product were investigated by SEM, TEM, XRD and Raman spectroscopy. The CVD-densified MWCNT felt has a higher bulk density and thermal conductivity than that of the corresponding high temperature treated MWCNT felt.

    6. Heteroepitaxial YAlO3 Films on (100)SrTiO3 Substrates: The Use of Pole Figures as a Non-invasive Tool to Assess the Direction of Growth (pages 46–50)

      G. Malandrino, G. Grigoli and I. L. Fragalà

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200706664

      A novel MOCVD approach has been applied to the fabrication of YAlO3 films on SrTiO3 (100) substrates. This study points to the use of pole figures as a simple, economic, non invasive tool to assess the direction growth of YAlO3 films.

    7. Formation of the Porous Structure of Silicon Dioxide Thin Layers During Silane Oxidation (pages 51–56)

      F. N. Dultsev

      Article first published online: 20 FEB 2008 | DOI: 10.1002/cvde.200706663

      Gas-phase reactions of silane oxidation are considered; the effect of reagents on the formation of porous structure is revealed. The proposed process chart allows one to explain the effect of additives on the structure of resulting films. Basing on the results obtained by the kinetic simulation of the gas-phase processes within the proposed chart, routes to obtain SiO2 films with different porosities are proposed.

  5. Index

    1. Top of page
    2. Cover Picture
    3. Contents
    4. Guide for Authors
    5. Full Papers
    6. Index

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