Methylated [(benzene)(1,3-butadiene)Ru0] Derivatives as Novel MOCVD Precursors with Favorable Properties (pages 15–21)
Ilona Jipa, M. Aslam Siddiqi, Rehan A. Siddiqui, Burak Atakan, Hubertus Marbach, Till Cremer, Florian Maier, Hans-Peter Steinrück, Katia Danova, Nadejda Popovska, Frank W. Heinemann and Ulrich Zenneck
Article first published online: 16 MAR 2011 | DOI: 10.1002/cvde.201006853
Methylated [(benzene)(1,3-butadiene)Ru(0)] derivatives 1–3 have been designed and prepared as novel metal organic chemical vapor deposition (MOCVD) precursor complexes. They can be evaporated without decomposition below 100°C, and thin Ru films can be obtained from 200°C substrate temperature on. Purity of the films is granted by the inherent properties of both the precursor complexes and the catalytically active freshly formed ruthenium film surfaces.