Chemical Vapor Deposition

Cover image for Vol. 17 Issue 10‐12

December, 2011

Volume 17, Issue 10-12

Pages 271–374

  1. Cover Picture

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Essay
    7. Reviews
    8. Full Papers
  2. Masthead

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Essay
    7. Reviews
    8. Full Papers
    1. Masthead

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201190011

  3. Contents

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Essay
    7. Reviews
    8. Full Papers
    1. Contents: (Chem. Vap. Deposition 10–11–12/2011) (pages 271–273)

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201190009

  4. Editorial

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Essay
    7. Reviews
    8. Full Papers
  5. Essay

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Essay
    7. Reviews
    8. Full Papers
    1. Céad Mile Fáilte (pages 279–283)

      Russell Binions

      Article first published online: 22 NOV 2011 | DOI: 10.1002/cvde.201100102

      Dr. Russell Binions shares some personal recollections and reflections on EuroCVD 18 held in Kinsale, just south of Cork, where everyone experienced Céad Mile Fáilte – a hundred thousand welcomes − of Irish hospitality.

  6. Reviews

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Essay
    7. Reviews
    8. Full Papers
    1. Developments of TaN ALD Process for 3D Conformal Coatings (pages 284–295)

      Virginie Brizé, Thomas Prieur, Perrine Violet, Laurent Artaud, Grégory Berthomé, Elisabeth Blanquet, Raphaël Boichot, Stéphane Coindeau, Béatrice Doisneau, Alexis Farcy, Arnaud Mantoux, Ioana Nuta, Michel Pons and Fabien Volpi

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201100045

      Thumbnail image of graphical abstract

      ALD of TaN thin films is explored using the combination between the thermodynamical behavior of the precursor, mass transfer in the reactor and the operating conditions. TaN thin film has been deposited on very complex shape substrates, such as nanodots, TSV, and silicon.

    2. Polymer Electrolyte Fuel Cell Electrodes Grown by Vapor Deposition Techniques (pages 296–304)

      Pascal Brault, Amaël Caillard and Anne-Lise Thomann

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201100046

      The present review article describes recent advances in the studies of solid polymer fuel cell electrodes. It emphasizes on CVD, PECVD and (PE)MOCVD as well as plasma sputtering techniques for growing such electrodes. Interest of each method is analyzed in terms of fuel cell performances.

  7. Full Papers

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Essay
    7. Reviews
    8. Full Papers
    1. Modeling of Silicon CVD into Agglomerates of Sub-micrometer-size Particles in a Fluidized Bed (pages 305–311)

      Nicolas Reuge and Brigitte Caussat

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201106888

      In order to better understand the mechanisms involved during silicon deposition from silane SiH4 into agglomerates of submicronic particles treated by Fluidized Bed CVD, two models have been developed. In the first one, classical equations of diffusion/reaction in porous medium have been solved whereas in the second case, the multifluid eulerian code MFIX has been used by considering the entire surface of particles.

    2. Simulation of Chemical Vapor Infiltration and Deposition Based on 3D Images: A Local Scale Approach (pages 312–320)

      William Ros, Gérard L. Vignoles, Christian Germain, Philippe Supiot and George Kokkoris

      Article first published online: 25 NOV 2011 | DOI: 10.1002/cvde.201106895

      A numerical tool based on Monte Carlo Random Walks in 3D images is presented as a solution for direct simulation of chemical vapor infiltration and of chemical vapor deposition over a patterned substrate. The code can also be used for determination of effective transport and reaction properties in a porous medium. Validations and application cases are shown and discussed.

    3. Organosilicon Polymers Deposition by PECVD and RPECVD on Micropatterned Substrates (pages 321–326)

      Philippe Supiot, Céline Vivien, Karine Blary and Vincent Rouessac

      Article first published online: 25 NOV 2011 | DOI: 10.1002/cvde.201106902

      Thin films of organosilicon materials are grown on micropatterned silicon substrates from the decomposition of the tetramethylsiloxane precursor by plasma-enhanced (PECVD) and remote plasma-enhanced (RPECVD) chemical vapor deposition. Fourier Transform IR spectroscopy and Scanning Electron Microscopy of the samples was used for this comparative study. The effects of pattern size and shape defined by the aspect ratio parameter, on the local growth rate are studied more specifically for trenches for both PECVD and RPECVD processes.

    4. Conformality Investigation of Titanium Dioxide Thin Films on 3-D Micrometer- and Nanometer-scale Features by Pulsed-Pressure Metal-organic CVD (pages 327–336)

      Vilailuck Siriwongrungson, Susan P. Krumdieck and Maan M. Alkaisi

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201106912

      Thumbnail image of graphical abstract

      The effect of pulsed-pressure MOCVD processing parameters on conformality was studied by TiO2 deposition on micron-scale and nano-scale features on Si and Si2N3 wafer samples. A statistical measure for conformality is presented. The conformality is shown to be insensitive to processing parameters over a wide range of pulse exposure, pressure and precursor concentration for growth rates from 0.5 nm/pulse to 2.4 nm/pulse.

    5. Direct Synthesis of ZnO Nanowires on Nanopatterned Surface by Magnetron Sputtering (pages 337–341)

      Abdel-Aziz El Mel, Marie Buffière, Florian Massuyeau, Eric Gautron, Wei Xu, Chang-Hwan Choi, Jany Wéry, Eric Faulques, Nicolas Barreau and Pierre-Yves Tessier

      Article first published online: 1 DEC 2011 | DOI: 10.1002/cvde.201106920

      ZnO nanowires arrays parallel to the substrate were directly deposited by magnetron sputtering selectively on the top of nanometric silicon line patterns prepared as a template. This method of synthesis is very simple and avoids the complicated steps of ZnO lithography. The nano-line template patterns were created by laser interference lithography combined with deep reactive ion etching. The nanowires exhibited a typical photoluminescence spectrum of ZnO.

    6. Supercritical Fluid Chemical Deposition as an Alternative Process to CVD for the Surface Modification of Materials (pages 342–352)

      Mélanie Majimel, Samuel Marre, Elsa Garrido and Cyril Aymonier

      Article first published online: 1 DEC 2011 | DOI: 10.1002/cvde.201106921

      This short review aims at giving readers information about Supercritical Fluid Chemical Deposition process (SFCD) for metal deposition as an alternative and complementary process to CVD. In particular, we highlight different examples of inorganic deposition (films or nanostructures) on various substrates among which are carbon nanotubes (CNTs) or silicon nanopatterned substrates.

    7. A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High-Aspect-Ratio Nanopores (pages 353–365)

      Raymond A. Adomaitis

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201106922

      We develop a model describing ballistic transport of precursors in an atomic layer deposition process for conformal deposition in high-aspect-ratio pore structures. Precursor transmission probability functions describing fluxes between pore surface features are developed, coupled to ALD surface reaction models, spatially discretized, and integrated over each precursor exposure period. Predictions from our dynamic model are compared to four previously published studies of ALD in nanopores to validate our simulator.

    8. Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD (pages 366–374)

      Anne-Lise Thomann, Constantin Vahlas, Lyacine Aloui, Diane Samelor, Amael Caillard, Nurhul Shaharil, Romuald Blanc and Eric Millon

      Article first published online: 15 DEC 2011 | DOI: 10.1002/cvde.201106936

      Thumbnail image of graphical abstract

      Physical vapor deposition (PVD) and chemical vapor deposition (CVD) are promising techniques for the deposition of thin films. In order to compare their ability to coat complex shaped surfaces, a micro-patterned silicon wafer has been developed. Aluminum thin films were deposited on this model substrate by pulsed laser deposition (PLD), magnetron sputtering (MS); and metal organic chemical vapor deposition (MOCVD). Results show that deposition by MOCVD in optimized conditions yield to conformal deposits. With MS, side and bottom thicknesses can be tailored by playing with the pattern dimensions, while PLD allows coating of a substrate, with the original pattern shape being transferred into the growing film.

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