Stoichiometry of Nickel Oxide Films Prepared by ALD (pages 177–180)
Julien Bachmann, Andriy Zolotaryov, Ole Albrecht, Silvana Goetze, Andreas Berger, Dietrich Hesse, Dmitri Novikov and Kornelius Nielsch
Article first published online: 1 SEP 2011 | DOI: 10.1002/cvde.201004300
Nickel oxide films obtained from nickelocene and ozone by atomic layer deposition at 230°C are substoichiometric, but have the crystal structure of NiO. Oxygen can be driven out of the solid by annealing under inert atmosphere, or added into it via aerobic annealing.