Chemical Vapor Deposition

Cover image for Vol. 19 Issue 10-11-12

December 2013

Volume 19, Issue 10-11-12

Pages 294–366

  1. Cover Picture

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Communications
    7. Full Papers
    1. You have free access to this content
      Cover image from I. P. Parkin and co-workers (Chem Vap. Deposition 2013, 19, 355)

      Article first published online: 11 DEC 2013 | DOI: 10.1002/cvde.201371011

      Thumbnail image of graphical abstract

      Four different TiO2 thin films are prepared using AACVD, APCVD, and combined AACVD and APCVD in order to obtain films with new morphologies. The photocatalytic properties are assessed qualitatively by Resazurin and quantitatively using tris(hydroxymethyl)aminomethane.

  2. Masthead

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Communications
    7. Full Papers
    1. Chem. Vap. Deposition (10–11–12/2013) (page 294)

      Article first published online: 11 DEC 2013 | DOI: 10.1002/cvde.201371012

  3. Contents

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Communications
    7. Full Papers
    1. Chem. Vap. Deposition (10–11–12/2013) (pages 295–296)

      Article first published online: 11 DEC 2013 | DOI: 10.1002/cvde.201371013

  4. Review

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Communications
    7. Full Papers
    1. Review of CVD Synthesis of Graphene (pages 297–322)

      Roberto Muñoz and Cristina Gómez-Aleixandre

      Article first published online: 6 NOV 2013 | DOI: 10.1002/cvde.201300051

      A comprehensive overview of the research highlights in graphene synthesis by CVD on metals is presented. The discussion includes new developments in transfer-free graphene growth on dielectric functional materials, and the latest exciting results in single-crystal, large-domain graphene synthesis. The role of the synthesis parameters, including thermodynamics, and the physical, chemical, and morphological properties of the catalyst, are also addressed.

  5. Communications

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Communications
    7. Full Papers
    1. Synthesis of Nitrogen-doped Carbon Nanocoils via One-step Acetonitrile Catalytic CVD using a Ni-Fe Layered Double Hydroxide as Catalyst Precursor (pages 323–326)

      Tomohiro Iwasaki, Masashi Tomisawa, Hideya Nakamura and Satoru Watano

      Article first published online: 31 OCT 2013 | DOI: 10.1002/cvde.201204018

      A simple catalytic CVD method for the synthesis of N-doped carbon nanocoils (CNCs), using acetonitrile as both the carbon and nitrogen source, is developed. A Ni–Fe layered double hydroxide that has not been subjected to any prior annealing or reducing treatment is used as a catalyst precursor. The steps of precursor-to-catalyst transformation, catalyst activation, deposition of CNCs, and nitrogen doping are performed in situ, in a single process.

    2. Parylene AF-4 via the Trapping of a Phenoxy Leaving Group (pages 327–331)

      Jay J. Senkevich

      Article first published online: 30 OCT 2013 | DOI: 10.1002/cvde.201304321

      A unique method of depositing parylene AF-4 via the cleavage and trapping of a phenoxy leaving group is presented. The leaving group is non-corrosive and the synthetic routes can be readily scalable. The method presented only works with parylene AF-4 because its threshold temperature (∼30°C) is lower than the melting point of the phenoxy radical (∼40°C). This method may prove to be a viable route for low-cost deposition of parylene AF-4 and its widespread use as a conformal coating where superior UV and oxidative stability is needed.

  6. Full Papers

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Communications
    7. Full Papers
    1. Growth of a Carbon Nanotube Forest on Silicon using Remote Plasma CVD (pages 332–337)

      Rinat R. Ismagilov, Petr V. Shvets, Aleksey A. Zolotukhin and Alexander N. Obraztsov

      Article first published online: 30 OCT 2013 | DOI: 10.1002/cvde.201207031

      A forest of aligned multiwalled carbon nanotubes is obtained, without a metal catalyst, by carbon deposition on a Si substrate from a methane/hydrogen gas mixture activated by DC discharge. A proposed model explains the metal-free nanotube synthesis by condensation of carbon on the inner part of the pores formed due to etching of the Si substrate in hydrogen plasma.

    2. Surface-immobilized Gold Nanoparticles by Organometallic CVD on Amine-terminated Glass Surfaces (pages 338–346)

      Erden Ertorer, Jessica C. Avery, Laura C. Pavelka and Silvia Mittler

      Article first published online: 6 NOV 2013 | DOI: 10.1002/cvde.201307055

      Organometallic (OM) CVD is used for fabricating surface-immobilized gold nanoparticles (AuNPs) on amine-terminated glass surfaces. Samples are characterized by UV-vis spectroscopy and scanning electron microscopy. The stability of the AuNPs is examined to investigate the suitability of the samples for biosensor applications. Biotin-streptavidin affinity is used to demonstrate plasmonic biosensor capabilities.

    3. Low-Temperature MOCVD of Crystalline Ga2O3 Nanowires using tBu3Ga (pages 347–354)

      Stephan Schulz, Georg Bendt, Wilfried Assenmacher, Daniel Sager and Gerd Bacher

      Article first published online: 6 NOV 2013 | DOI: 10.1002/cvde.201307060

      Thumbnail image of graphical abstract

      tBu3Ga is used as a novel Ga source for the low-temperature MOCVD growth of Ga2O3 nanowires under Au-catalyzed and self-catalyzed conditions. The Ga2O3 nanowires show efficient defect luminescence at room temperature in the visible and UV range, with blue and green emission peaks at 430 nm and 512 nm.

    4. Improved Texturing and Photocatalytic Efficiency in TiO2 Films Grown Using Aerosol-Assisted CVD and Atmospheric Pressure CVD (pages 355–362)

      Veronica Diesen, Mats Jonsson and Ivan P. Parkin

      Article first published online: 11 NOV 2013 | DOI: 10.1002/cvde.201307067

      Films are synthesized using AACVD, APCVD, and combined AACVD and APCVD, and then characterized by XRD, SEM, XPS, Raman, and water contact angle measurements. The photocatalytic efficiencies of the films are assessed qualitatively by the well-established ink test based on Resazurin, and quantitatively studied by a new method based on tris(hydroxymethyl)aminomethane. It is shown that both methods are in agreement.

    5. Substrate-thickness Dependence of Hydrogenated Microcrystalline Silicon Nucleation Rate on Amorphous Silicon Layer (pages 363–366)

      Zewen Zuo, Guanglei Cui, Yu Wang, Junzhuan Wang, Lin Pu and Yi Shi

      Article first published online: 12 NOV 2013 | DOI: 10.1002/cvde.201307003

      Thumbnail image of graphical abstract

      The nucleation rate of µc-Si is dependent on the thickness of the a-Si:H layer and can be correlated with the stress inside the a-Si:H layer. The a-Si layer on glass initially grows in a 2D mode with a high interfacial stress inside, while the growth mode turns to S-K mode with increasing thickness, allowing for the interfacial stress to be relaxed through the formation of islands.

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