Chemical Vapor Deposition

Cover image for Chemical Vapor Deposition

May 1996

Volume 2, Issue 3

Pages fmi–fmi, 85–118

  1. Masthead

    1. Top of page
    2. Masthead
    3. Articles
    4. Communications
    5. Full Papers
    6. Research Newss
    7. Book Reviews
    1. Masthead (page fmi)

      Article first published online: 4 OCT 2004 | DOI: 10.1002/cvde.19960020301

  2. Articles

    1. Top of page
    2. Masthead
    3. Articles
    4. Communications
    5. Full Papers
    6. Research Newss
    7. Book Reviews
    1. Metal Chalcogenide Materials: Chalcogenolato complexes as “single-source” precursors (pages 85–96)

      Prof. Manfred Bochmann

      Article first published online: 4 OCT 2004 | DOI: 10.1002/cvde.19960020302

      Modern inorganic materials are required to fulfill a range of demands for quality and performance in an increasing number of applications. Single-source precursor molecules can satisfy many of these requirements. In this review article ligand design (leading, for example, to the dimer shown in the Figure) to address problems associated with gas phase pre-reactions, thermal stability, ease of handling, toxicity, and purity for II-VI deposition are discussed.

    2. Chemical Vapor Deposition Topotaxy in Porous Hosts (pages 97–103)

      Dr. Carol L. Bowes, Dr. Andrzej Malek and Prof. Geoffrey A. Ozin

      Article first published online: 4 OCT 2004 | DOI: 10.1002/cvde.19960020303

      The extension of CVD to 3-D structures for applications in the fields of catalysis, quantum electronics and optics, optical data storage, ceramic composites, and chemoselective sensing is discussed. This technique of “CVD topotaxy” –putting a deposit in a particular place—has been applied, for example, to the quest for spatial confinement of semiconductors through the MOCVD of cadmium, zinc, and tin sulfides in 13 Å cavities of zeolite Y.

  3. Communications

    1. Top of page
    2. Masthead
    3. Articles
    4. Communications
    5. Full Papers
    6. Research Newss
    7. Book Reviews
    1. Synthesis and characterization of polyether adducts of group 2 metal thioacetates: Single-source precursors to binary metal sulfide films, MS, where M [DOUBLE BOND] Ca, Sr, Ba (pages 105–108)

      Dr. Klaus Kunze, Dr. Laurent Bihry, Dr. Paolina Atanasova, Prof. Mark J. Hampden-Smith and Dr. Eileen N. Duesler

      Article first published online: 4 OCT 2004 | DOI: 10.1002/cvde.19960020304

      New polyether adducts of group 2 thioacetate complexes for the formation of binary metal sulfides are described. The synthesis and characterization of such precursors and their thermal reactivity to form the corresponding binary metal sulfides are briefly reported here. It is also shown that they can be used as single-source precursors for aerosol-assisted CVD, as illustrated by the deposition of CaS from Ca(SOCMe)2 · 15-crown-5.

  4. Full Papers

    1. Top of page
    2. Masthead
    3. Articles
    4. Communications
    5. Full Papers
    6. Research Newss
    7. Book Reviews
    1. In situ halide chemical vapor deposition of Bi2Sr2CaCu2O8 + x on silver substrates (pages 109–112)

      Dr. Anders Hårsta and Stefan Lundquist

      Article first published online: 4 OCT 2004 | DOI: 10.1002/cvde.19960020305

      The first example of in situ CVD of the 2212 phase of BSCCO on Ag substrates is reported in this paper. The precursors used were the metal iodides. The films (the Figure shows a scanning electron micrograph) had a pronounced [001] orientation and a Tc of 80 K without post-deposition annealing. After annealing the [001] orientation was improved but the Tc was reduced to 75 K.

  5. Research Newss

    1. Top of page
    2. Masthead
    3. Articles
    4. Communications
    5. Full Papers
    6. Research Newss
    7. Book Reviews
    1. Trends in precursor selection for MOCVD (pages 113–116)

      Dr. Francis Maury

      Article first published online: 4 OCT 2004 | DOI: 10.1002/cvde.19960020306

      MOCVD has many promising advantages over physical processes but industrial applications are still sparse, probably because commercial availability of suitable precursors is limited. In this Research News article the stringent requirements for metal-organic compounds for thermal MOCVD as well as for photo-MOCVD and MOMBE are critically reviewed. In particular, the problem of carbon incorporation in deposited films and the use of single-source precursors for multi-element deposits are discussed.

  6. Book Reviews

    1. Top of page
    2. Masthead
    3. Articles
    4. Communications
    5. Full Papers
    6. Research Newss
    7. Book Reviews

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