Dr. Ian M. Watson
Review: The quality of HTS films produced by MOCVD is now similar to that obtained by any other method. For example, it is possible to grow precipitate-free films with a roughness better than ±1 nm over a 10 μm square area (see Figure). In addition, MOCVD has the attractive opportunity for large area growth. This article reviews precursors for YBCO growth, methods of delivering the precursors to the reactor deposition zone and of activating the deposition process, and applications of MOCVD YBCO layers.