Chemical Vapor Deposition

Cover image for Chemical Vapor Deposition

August 1997

Volume 3, Issue 4

Pages fmi–fmi, 159–230

  1. Masthead

    1. Top of page
    2. Masthead
    3. Essay
    4. Articles
    5. Communications
    6. Full Paper
    7. Book Review
    1. Masthead (page fmi)

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030401

  2. Essay

    1. Top of page
    2. Masthead
    3. Essay
    4. Articles
    5. Communications
    6. Full Paper
    7. Book Review
    1. Du CVD et d'Autres Choses (pages 159–160)

      Prof. Michael Hitchman

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030402

      Parlez-vous franglais? C'est un morceau de gâteau for those attending the truly international meeting in Paris, which will bring together for the first time EUROCVD 11 and CVD XIV. The background to this meeting is given here together with a short review of the aims and objectives of CVD. There is clearly a strong overlap of cVD interests between the journal and the meeting and we can look forward to some interesting synergism arising from the happy confluence of the two. II sera un bon'appening!

    2. Recollections of CVD Conferences (pages 161–166)

      Dr. John M. Blocher Jr.

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030403

      The “father” of CVD, Dr. John Blocher, takes us on a nostalgic trip down memory lane with some personal recollections about the beginning of CVD and about the International CVD and EUROCVD conferences he has attended over the last 30 years. There are some delightful professional and social cameos, illustrating the scientific stimulation and sense of community the meetings have provided. The younger members of the international CVD community will indeed see that we have a substantial and rich heritage.

  3. Articles

    1. Top of page
    2. Masthead
    3. Essay
    4. Articles
    5. Communications
    6. Full Paper
    7. Book Review
    1. Volatile Metal β-Diketonates: ALE and CVD precursors for electroluminescent device thin films (pages 167–182)

      Dr. Marja Tiitta and Prof. Lauri Niinistou

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030404

      Current research on thin film electroluminescent materials focuses on improving the blue color produced by cerium doping of alkaline earth sulfides and thio gallates. The synthesis and properties of β-diketonate chelate precursors and the growth and characterization of layers obtained with them are reviewed. A perspective view of a cerium precursor is shown in the Figure.

    2. Quantum Modeling of the CVD of transition metal materials (pages 183–192)

      Dr. Thomas R. Cundari and Dr. Shaun O. Sommerer

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030405

      Quantum modeling can yield new insights into decomposition pathways of CVD precursors. This review analyzes kinetic trends as a function of precursor components. It is found, for example, that heavier metals and lighter main group elements have higher elimination barriers, while for elements within the same main group row lower elimination barriers correlate with increasing element electronegativity. Despite progress such as this, though, many challenges remain in quantum modeling of precursor reactions.

  4. Communications

    1. Top of page
    2. Masthead
    3. Essay
    4. Articles
    5. Communications
    6. Full Paper
    7. Book Review
    1. Epitaxial BaTiO3 films grown by aerosol MOCVD (pages 193–196)

      Dr. Oleg Y. U. Gorbenko, Prof. Andrey R. Kaul and Prof. Georg Wahl

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030406

      BaTiO3 tin films are promising for electronic and optoelectronic devices. Current growth techniques give rather low deposition rates for practical applications. Here epitaxial growth rates over 100 times higher have been achieved using aerosol CVD with surface diffusion enhancement in the presence of Bio-containing vapor. The AFM image shows a typical layer with an rms roughness of 12 nm.

    2. Metal-containing poly (p-xylylene) films by CVD: Poly (p-xylylene) with germanium crystals (pages 197–200)

      Prof. Henning Hopf, Prof. Genrikh N. Gerasimov, Dr. Sergei N. Chavalun, Prof. Valerial I. Rozenberg, Dr. Elena L. Popova, Elena V. Nikolaeva, Dr. Evgenii I. Grogoriev, Dr. Sergei A. Zavjalov and Prof. Leonid I. Trakhtenberg

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030407

      Metal-containing polymer films are of interest for sensor, magnetic, nonlinear optical, and catalytic applications. This communication describes the preparation of poly(p-xylylene) coatings incorporating Ge crystals from Ge-containing paracyclophane monomer. Vapor pyrolysis of the monomer gives copolymer films with Ge fragments, which are thermally decomposed to Ge crystals. This leads to an increase in film conductivity and there is the potential for an application as a humidity sensor.

  5. Full Paper

    1. Top of page
    2. Masthead
    3. Essay
    4. Articles
    5. Communications
    6. Full Paper
    7. Book Review
    1. Plasma Polymer Films for Dropwise Condensation of Steam (pages 201–207)

      Mark P. Bonnar, Dr. Bryce M. Burnside, Alan Little, Prof. Robert L. Reuben and Prof. John I. B. Wilson

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030408

      There is a need for hydrophobic layers on the surfaces of turbine condensers to promote dropwise steam condensation. Previous coatings have been too thick to allow efficient heat transfer. Thin hydrophobic filsm have been produced by plasma CVD from hexametyldisiloxane. Steam immersion tests have exceeded 7500 hours with excellent dropwise condensation being achieved (see Figure).

    2. Photochemical Vapor Deposition of Wide Bandgap III-V Materials: Influence of Photochemically Generated Radicals on the Growth of Aluminum Nitride and Gallium Nitride Films (pages 209–217)

      Dr. James J. Alwan and Prof. J. Gary Eden

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030409

      There has been a rapid development of wide bandgap III-V materials for optoelectronic applications. This has lead to an interest in the mechanisms of their growth and doping as well as new approaches to reduced temperature deposition. Here results for AIN an GaN growth by laser photoCVD and MOCVD at temperatures as low as 600°C are reported. Kinetic modeling of growth dependence on laser pulse energy suggests that the dominant photolytically produced species is the amidogen radical, NH2.

    3. Ion-Beam-Induced CVD: An Alternative Method of Thin Film Preparation (pages 219–226)

      Dr. Juan P. Espinós, Dr. Asunción Fernádez, Dr. Alfonso Caballero, Dr. Victor M. Jiménez, Dr. Juan C. Sánchez-López, Dr. Leopoldo Contreras, Dr. Dietmar Leinen and Dr. Agustin R. González-Elipe

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030410

      A new CVD process activated by ion beams is reported. THe principle of the technique is illustrated in the Figure. A volatile organometallic precursor is decomposed by the action of an accelerated beam of Omath image or Nmath image ions. Thin films of single and mixed oxides and nitride have been prepared by this procedure, and of particular interest is the preferential removal of C by Omath image.

    4. The Growth of Indium Selenide Thin Films from a Novel Asymmetric Dialkyldiselenocarbamate of Indium (pages 227–229)

      Prof. Paul O'Brien, Dr. David J. Otway and Dr. John R. Walsh

      Version of Record online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030411

      A novel asymmetric precursor of indium for the LP-MOCVD of In2Se3 is described. The use of a volatile, air stable tris(dialkyldiselenocarbamate) of indium(III) results in the growth of thin films in which the phase and stoichiometry are determined predominantly by the composition and molecular shape of the precursor rather than the deposition temperature or the substrate material. Characterization of the films by XRD shows that they are highly oriented and consist of single-phase material.

  6. Book Review

    1. Top of page
    2. Masthead
    3. Essay
    4. Articles
    5. Communications
    6. Full Paper
    7. Book Review

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