Chemical Vapor Deposition

Cover image for Chemical Vapor Deposition

October 1997

Volume 3, Issue 5

Pages fmi–fmi, 239–289

  1. Masthead

    1. Top of page
    2. Masthead
    3. Articles
    4. Full Papers
    5. Full Paper (Correction)
    6. Book Reviews
    1. Masthead (page fmi)

      Article first published online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030501

  2. Articles

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    3. Articles
    4. Full Papers
    5. Full Paper (Correction)
    6. Book Reviews
    1. Plasma-assisted CVD of cubic boron nitride (pages 239–255)

      Dr. Igor Konyashin, Dr. Joachim Bill and Prof. Fritz Aldinger

      Article first published online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030502

      Review: Cubic boron nitride has soe advantages over diamond for tool and semiconductor applications. Until recently, It was produced by high pressure and high temperature methods, but now CVD has become a powerful mean sof forming thin films or coatings. This paper reviews deposition techniques and parameters, precursors, and substrates used in PACVD. The of a crystalline film.

  3. Full Papers

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    5. Full Paper (Correction)
    6. Book Reviews
    1. Boron Carbonitride Thin Films by PACVD of Single-Source Precursors (pages 257–262)

      Dirk Hegemann, Prof. Ralf Riedel, Dr. Wolfgang Dreßler, Dr. Christian Oehr, Dr. Bernd Schindler and Prof. Herwig Brunner

      Article first published online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030503

      Full Paper: Compounds in the B-C-N system are expected to exhibit outstanding properties. A significant parameter in depositing superhard materials is the momentum of the ions accelerating towards the substrate. This work reports on the preparation of BCxNy films by PACVD at low substrate temperatures and their characterization over a wide range of ion momenta obtained by varying the applied power density and the carrier gas. It is found that the higher the momentum, the higher the film hardness obtained.

    2. Origins of Texture in TTF-TCNQ Thin Films Grown by Organic CVD from TTF and TCNQ Precursors (pages 263–269)

      Jaume Caro, Dr. Jordi Fraxedas and Dr. Albert Figueras

      Article first published online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030504

      Full Paper: TTF-TCNQ was the first truly organic metal to be synthesized. This charge-transfer complex has a crystal structure of parallel chains of donors (TTF) and acceptors (TCNQ) (see Figure). This paper describes the CVD of the organic conductor, and a growth model based on the interaction energy between the first monolayer and the substrate gives an understanding of the different textures found.

    3. Structural and Electrical Changes in Polycrystalline Silicon Thin Films That Are Heavily In Situ Boron-Doped and Thermally Oxidized with Dry Oxygen (pages 271–279)

      Dr. Messaoud Boukezzata, Dr. Boubekeur Birouk, Dr. Farida Mansour and Dr. Daniéle Bielle-Daspet

      Article first published online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030505

      Full Paper: In situ doped polysilicon films are widely used in MOS and bipolar devices. It is important that film dopants do not diffuse outside the defined region, but subsequent thermal treatments can change the initial distributions an so limit the use of the films for narrow junctions. This study shows that post-deposition thermal processes lead to significant modification, structural defects, and solubility limitations.

  4. Full Paper (Correction)

    1. Top of page
    2. Masthead
    3. Articles
    4. Full Papers
    5. Full Paper (Correction)
    6. Book Reviews
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      Palladium thin films grown by CVD from (1,1,1,5,5,5-hexafluoro-2,4-pentanedionato) palladium(II) (pages 281–286)

      Vijay Bhaskaran, Prof. Mark J. Hampden-Smith and Prof. Toivo T. Kodas

      Article first published online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030506

  5. Book Reviews

    1. Top of page
    2. Masthead
    3. Articles
    4. Full Papers
    5. Full Paper (Correction)
    6. Book Reviews

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