Boron Carbonitride Thin Films by PACVD of Single-Source Precursors (pages 257–262)
Dirk Hegemann, Prof. Ralf Riedel, Dr. Wolfgang Dreßler, Dr. Christian Oehr, Dr. Bernd Schindler and Prof. Herwig Brunner
Article first published online: 2 NOV 2004 | DOI: 10.1002/cvde.19970030503
Full Paper: Compounds in the B-C-N system are expected to exhibit outstanding properties. A significant parameter in depositing superhard materials is the momentum of the ions accelerating towards the substrate. This work reports on the preparation of BCxNy films by PACVD at low substrate temperatures and their characterization over a wide range of ion momenta obtained by varying the applied power density and the carrier gas. It is found that the higher the momentum, the higher the film hardness obtained.