Research Article
Influence of atomic force microscopy acquisition parameters on thin film roughness analysis
Article first published online: 24 FEB 2012
DOI: 10.1002/jemt.22014
Copyright © 2012 Wiley Periodicals, Inc.
Additional Information
How to Cite
Hristu, R., Stanciu, S. G., Stanciu, G. A., Çapan, İ., Güner, B. and Erdoğan, M. (2012), Influence of atomic force microscopy acquisition parameters on thin film roughness analysis. Microsc. Res. Tech., 75: 921–927. doi: 10.1002/jemt.22014
Publication History
- Issue published online: 19 JUN 2012
- Article first published online: 24 FEB 2012
- Manuscript Accepted: 15 DEC 2011
- Manuscript Received: 20 OCT 2011
Funded by
- CNCSIS–UEFISCDI. Grant Number: 726/2009
- ANCS Bilateral Cooperation Program. Grant Number: 414/2010
- TUBITAK Bilateral Cooperation Programme. Grant Number: 109T612
- Abstract
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- Cited By
Keywords:
- gas sensing properties;
- scanning probe microscopy;
- surface roughness;
- porphyrin thin films
Abstract
A reliable procedure for measuring parameters connected to surface roughness is needed to compare the gas sensing properties of various thin films or the effect of different fabrication procedures on the surface roughness and the sensing properties. In this article, we propose to investigate how the acquisition parameters specific to atomic force microscopy investigations such as pixel size, scan area and scan speed influence the roughness parameters, namely root mean square and surface area ratio, commonly used for characterizing the gas sensing properties of porphyrins and other materials. Microsc. Res. Tech. 2012. © 2012 Wiley Periodicals, Inc.

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