Research Article

Investigation on microstructures of MnSix thin films by Raman spectroscopy

  1. J. L. Wang1,
  2. W. F. Su1,
  3. R. Xu2,
  4. Y. L. Fan1,
  5. Z. M. Jiang1,*

Article first published online: 19 SEP 2008

DOI: 10.1002/jrs.2122

Issue

Journal of Raman Spectroscopy

Journal of Raman Spectroscopy

Volume 40, Issue 3, pages 335–337, March 2009

Additional Information

How to Cite

Wang, J. L., Su, W. F., Xu, R., Fan, Y. L. and Jiang, Z. M. (2009), Investigation on microstructures of MnSix thin films by Raman spectroscopy. J. Raman Spectrosc., 40: 335–337. doi: 10.1002/jrs.2122

Author Information

  1. 1

    Surface Physics Laboratory (National Key Laboratory), Fudan University, 200433 Shanghai, China

  2. 2

    Department of Electronic Information Materials, School of Materials Science and Engineering, Shanghai University, 200444 Shanghai, China

*Surface Physics Laboratory (National Key Laboratory), Fudan University, 200433 Shanghai, China.

Publication History

  1. Issue published online: 6 MAR 2009
  2. Article first published online: 19 SEP 2008
  3. Manuscript Accepted: 11 AUG 2008
  4. Manuscript Received: 4 JUN 2008

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Keywords:

  • Raman spectroscopy;
  • MnSi;
  • magnetic semiconductors;
  • magnetic metals

Abstract

In this paper, Raman spectroscopy is used to study the microstructures of MnSix thin films annealed at different temperatures. Two phases of Mn silicides, MnSi1.73 and MnSi, are identified, and their Raman spectra are reported. Each phase of Mn silicides shows a set of three well-defined peaks at about 300 cm−1 in the spectrum, which could be used as fingerprints in identifying the formation of the Mn silicides. Compared with conventional X-ray diffraction method, Raman spectroscopy is found to be more sensitive to investigate the microstructures of Mn silicides, especially at the initial stage of formation of the Mn silicides. Copyright © 2008 John Wiley & Sons, Ltd.

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