Study of carrier concentration profiles in Al-implanted Ge by micro-Raman spectroscopy under different excitation wavelengths
Article first published online: 14 MAR 2013
Copyright © 2013 John Wiley & Sons, Ltd.
Journal of Raman Spectroscopy
Volume 44, Issue 5, pages 665–669, May 2013
How to Cite
Sanson, A., Giarola, M., Napolitani, E., Impellizzeri, G., Privitera, V., Carnera, A. and Mariotto, G. (2013), Study of carrier concentration profiles in Al-implanted Ge by micro-Raman spectroscopy under different excitation wavelengths. J. Raman Spectrosc., 44: 665–669. doi: 10.1002/jrs.4249
- Issue published online: 10 MAY 2013
- Article first published online: 14 MAR 2013
- Manuscript Accepted: 11 DEC 2012
- Manuscript Revised: 14 NOV 2012
- Manuscript Received: 12 OCT 2012
Options for accessing this content:
- Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
- You can purchase online access to this Article for a 24-hour period (price varies by title)
- New Users: Please register, then proceed to purchase the article.
Registered Users please login:
- Access your saved publications, articles and searches
- Manage your email alerts, orders and subscriptions
- Change your contact information, including your password
Please register to:
- Save publications, articles and searches
- Get email alerts
- Get all the benefits mentioned below!