Ion beam engineered nano silver silicon substrates for surface enhanced Raman spectroscopy

Authors


Correspondence to: Dharshana N. Wijesundera, Department of Physics and Texas Center for Superconductivity, University of Houston, 4800 Calhoun Rd., Houston, TX 77004, USA

E-mail: dnwijesundera@uh.edu

Abstract

We demonstrate a method for engineering substrates for surface enhanced Raman spectroscopy (SERS) by Ag ion implantation in Si. The implantation dose and beam current density are chosen such that the Ag concentration in Si exceeds the solid solubility limit, causes aggregation of Ag and nucleates Ag nano particles. The embedded nano particles are then partially exposed by a wet etch process. Our measurements show that the so fabricated nano-composite substrates are very effective as stable and reproducible SERS substrates. Copyright © 2013 John Wiley & Sons, Ltd.

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