Two-photon stereolithography for realizing ultraprecise three-dimensional nano/microdevices
Article first published online: 24 NOV 2008
Copyright © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Laser & Photonics Reviews
Volume 3, Issue 1-2, pages 1–11, February 2009
How to Cite
Park, S.-H., Yang, D.-Y. and Lee, K.-S. (2009), Two-photon stereolithography for realizing ultraprecise three-dimensional nano/microdevices. Laser & Photon. Rev., 3: 1–11. doi: 10.1002/lpor.200810027
- Issue published online: 19 FEB 2009
- Article first published online: 24 NOV 2008
- Manuscript Accepted: 21 AUG 2008
- Manuscript Revised: 18 AUG 2008
- Manuscript Received: 16 JUL 2008
- Korea Foundation for International Cooperation of Science & Technology. Grant Number: K20702000013-07E0200-01310
- KOSEF. Grant Number: M10503000217-05M0300-21700
- Active Polymer Center for Pattern Integration. Grant Number: KOSEF ERC R11-2007-050-01002-0
- Asian Office of Aerospace Research and Development (AOARD), USA
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