Back Cover Picture: Laser & Photon. Rev. 7(2)/2013


Abstract

Proof-of-concept nanolithography system is designed and demonstrated for producing a sub-wavelength interference pattern. The system employs the spatially-confined diffraction in a hyperbolic medium arranged of alternating planar metallic and dielectric layers. Volume plasmon polaritons excited with the top mask propagate across the metallic-dielectric interfaces along the characteristic planes inside the hyperbolic slab. Shown is the numerically simulated grating nanolithography pattern

(Picture: S. Ishii et al. dx.doi.org/10.1002/lpor.201200095, pp. 265–271, in this issue)

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