Branched and Network Polysilanes as Cleavable Macrophotoinitiators (pages 2619–2625)Mohamad-Ali Tehfe, Jacques Lalevée, Ravi Shankar, Usharani Sahoo, Fabrice Morlet-Savary, Bernadette Graff and Jean-Pierre Fouassier
Article first published online: 18 OCT 2011 | DOI: 10.1002/macp.201100440

Branched and network polysilanes [Et2Si(CH2)3Si]n and [(PhMeSi)0.8-co-(Et3Si(CH2)2Si)0.2]n are proposed as sources of silyl radicals. The direct cleavage of the Si—Si bonds in these oligomers ensures the formation of reactive silyl radicals. The examples shown outline the interest of poly(silane)s as macrophotoinitiators in FRP or FRPCP processes. The specific behavior of PSs under air is worthwhile for practical applications.