Water-Developable Poly(2-oxazoline)-Based Negative Photoresists
Version of Record online: 19 JAN 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Macromolecular Rapid Communications
Volume 33, Issue 5, pages 396–400, March 16, 2012
How to Cite
Schenk, V., Ellmaier, L., Rossegger, E., Edler, M., Griesser, T., Weidinger, G. and Wiesbrock, F. (2012), Water-Developable Poly(2-oxazoline)-Based Negative Photoresists. Macromol. Rapid Commun., 33: 396–400. doi: 10.1002/marc.201100717
- Issue online: 6 MAR 2012
- Version of Record online: 19 JAN 2012
- Manuscript Revised: 29 NOV 2011
- Manuscript Received: 30 OCT 2011
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