Communication
Water-Developable Poly(2-oxazoline)-Based Negative Photoresists
Article first published online: 19 JAN 2012
DOI: 10.1002/marc.201100717
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Schenk, V., Ellmaier, L., Rossegger, E., Edler, M., Griesser, T., Weidinger, G. and Wiesbrock, F. (2012), Water-Developable Poly(2-oxazoline)-Based Negative Photoresists. Macromol. Rapid Commun., 33: 396–400. doi: 10.1002/marc.201100717
Publication History
- Issue published online: 6 MAR 2012
- Article first published online: 19 JAN 2012
- Manuscript Revised: 29 NOV 2011
- Manuscript Received: 30 OCT 2011
- Abstract
- Article
- References
- Supporting Information
- Cited By
Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors.
| Filename | Format | Size | Description |
|---|---|---|---|
| marc_201100717_sm_suppl.pdf | 81K | suppl |
Please note: Wiley-Blackwell is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.

1521-3927/asset/2263_left.gif?v=1&s=61570e8230e32db3bfcc55b0c9074fac6bd562eb)
1521-3927/asset/2263_right.gif?v=1&s=fcf60ab223a5a383ae704a65bdfb9a5e44a35e8b)
