Orienting the Demixion of a Diblock-copolymer Using 193 nm Interferometric Lithography for the Controlled Deposition of Nanoparticles (pages 1627–1633)
Ali Dirani, Fabrice Stehlin, Ihab Dika, Arnaud Spangenberg, Nathan Grumbach, Jean-Louis Gallani, Bertrand Donnio, Romain Greget, Sylvie Begin-Colin, Arnaud Demortière and Olivier Soppera
Version of Record online: 16 AUG 2011 | DOI: 10.1002/marc.201100399
DUV interferometric lithography and diblock copolymer self-organization have been combined to provide a simple and highly collective nanopatterning technique enabling the organization of nanoparticles over several orders of magnitude. This process opens new doors towards the preparation of high-density arrays of magnetic nanoparticles with potential applications in data storage.