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Abstract

The present work applies the integral method to analyze the momentum and mass transfer in thin liquid films on spinning disks, with the aim to describe the complex process of wet chemical etching of rotating silicon wafers The obtained results capture very well the essential features of the etching activity on the disk, and are in good agreement with experimental results. (© 2011 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim)