Polymer Engineering & Science

Cover image for Polymer Engineering & Science

July 1974

Volume 14, Issue 7

Pages fmi–fmi, 481–541

  1. Masthead

    1. Top of page
    2. Masthead
    3. Preface
    4. Articles
    1. You have free access to this content
      Masthead (page fmi)

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140701

  2. Preface

    1. Top of page
    2. Masthead
    3. Preface
    4. Articles
    1. Preface (page 481)

      Maung S. Htoo

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140702

  3. Articles

    1. Top of page
    2. Masthead
    3. Preface
    4. Articles
    1. Photochemistry in the solid phase (pages 482–486)

      J. E. Guillet

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140703

    2. Azide photoresists for projection photolithography (pages 491–493)

      N. J. Clecak, R. J. Cox and W. M. Moreau

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140705

    3. Mechanism of refractive index increase in photosensitized poly(methyl methacrylate) (pages 494–497)

      M. J. Bowden, E. A. Chandross and I. P. Kaminow

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140706

    4. Flash exposure system for thin photoresist films (pages 509–512)

      D. E. O'Hora and W. F. Beuschel

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140708

    5. The interaction of 5 KeV electrons with polymers of methyl isopropenyl ketone (pages 518–524)

      Aaron W. Levine, Michael Kaplan and Eugene S. Poliniak

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140711

    6. Vapor development of poly(olefin sulfone) resists (pages 525–528)

      M. J. Bowden and L. F. Thompson

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140712

    7. Lithography and radiation chemistry of epoxy containing negative electron resists (pages 529–533)

      L. F. Thompson, E. D. Feit and R. D. Heidenreich

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760140713

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