Polymer Engineering & Science

Cover image for Polymer Engineering & Science

June 1977

Volume 17, Issue 6

Pages fmi–fmi, 349–429

  1. Masthead

    1. Top of page
    2. Masthead
    3. Introductory Remark
    4. Articles
    1. You have free access to this content
      Masthead (page fmi)

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170601

  2. Introductory Remark

    1. Top of page
    2. Masthead
    3. Introductory Remark
    4. Articles
    1. Introductory remarks (page 349)

      Dr. Maung S. Htoo

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170602

  3. Articles

    1. Top of page
    2. Masthead
    3. Introductory Remark
    4. Articles
    1. A water-soluble, reciprocity-law-failing photoresist (pages 353–355)

      Motoo Akagi, Saburo Nonogaki, Takahiro Kohashi, Yoichi Oba, Mitsuru Oikawa and Yoshifumi Tomita

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170604

    2. The effect of polymer host on volume phase holographic recording properties (pages 356–358)

      Allen Bloom, R. A. Bartolini and P. L. K. Hung

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170605

    3. Polyimides in lithography (pages 366–371)

      R. K. Agnihotri

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170607

    4. New photoresists of cyclized butadlene polymers (pages 372–376)

      Y. Harita, M. Ichikawa, K. Harada and T. Tsunoda

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170608

    5. Three dimensional behavior of negative electron resists (pages 377–380)

      R. D. Heidenreich and G. W. Kammlott

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170609

    6. Line-Profile resist development simulation techniques (pages 381–384)

      R. E. Jewett, P. I. Hagouel, A. R. Neureuther and T. Van Duzer

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170610

    7. X-ray lithography (pages 385–389)

      R. Feder, E. Spiller and J. Topalian

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170611

    8. Theoretical considerations on the sensitivities of electron beam resists (pages 390–395)

      Minoru Tsuda, Setsuko Oikawa and Akira Suzuki

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170612

    9. Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist (pages 396–401)

      Edward Gipstein, Augustus C. Ouano, Duane E. Johnson and Omar U. Need III

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170613

    10. Thermally-reacted poly(methacrylamide) as a positive electron beam resist (pages 410–413)

      S. Matsuda, S. Tsuchiya, M. Honma, K. Hasegawa, G. Nagamatsu and T. Asano

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170616

    11. Differential dissolution and electron-beam lithographic sensitivity of poly(methyl methacrylate) (pages 414–419)

      J. N. Helbert, C. F. Cook Jr., E. H. Poindexter and B. E. Wagner

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170617

    12. Sensitive chlorine-containing resists for X-ray lithography (pages 420–429)

      Gary N. Taylor, Gerald A. Coquin and Sasson Somekh

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760170618

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