Polymer Engineering & Science

Cover image for Polymer Engineering & Science

November 1980

Volume 20, Issue 16

Pages fmi–fmi, 1049–1114

  1. Masthead

    1. Top of page
    2. Masthead
    3. Articles
    1. Masthead (page fmi)

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201601

  2. Articles

    1. Top of page
    2. Masthead
    3. Articles
    1. Iodinated polystyrene: An ion-millable negative resist (pages 1054–1057)

      H. Shiraishi, Y. Taniguchi, S. Horigome and S. Nonogaki

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201603

    2. Electron-beam lithography of chlorinated polystyrenes with narrow molecular weight distributions (pages 1058–1063)

      Eugene D. Feit and Larry E. Stillwagon

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201604

    3. Sensitivity and contrast of some proton-beam resists (pages 1064–1068)

      Robert G. Brault and Leroy J. Miller

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201605

    4. Lithographic technique using radiation-induced grafting of acrylic acid into poly(methyl methacrylate) films (pages 1069–1072)

      M. Gazard, C. Duchesne, J. C. Dubois and A. Chapiro

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201606

    5. Sensitivity of diazoquinone resists to optical and electron-beam exposure (pages 1073–1076)

      Michael Kaplan and Dietrich Meyerhofer

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201607

    6. Effect of chemical composition upon the radiation and electron beam resist behaviors of vinyl polymers (pages 1077–1081)

      J. N. Helbert, G. J. Iafrate, C. U. Pittman Jr and J. H. Lai

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201608

    7. Electron sensitive negative resists of vinylaromatic polymers (pages 1082–1086)

      J. C. Jagt and A. P. G. Sevriens

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201609

    8. Oxygen plasma removal of thin polymer films (pages 1087–1092)

      G. N. Taylor and T. M. Wolf

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201610

    9. Photoresist development by plasma (pages 1093–1096)

      H. G. Hughes, W. R. Goodner, T. E. Wood, J. N. Smith and J. V. Keller

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201611

    10. Device processing using the trilevel technique (pages 1097–1101)

      J. M. Moran and D. Maydan

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201612

    11. Evaluation of optics and resists for 3000 Å wavelength photolithography with a Perkin-Elmer printer (pages 1102–1109)

      T. A. Shankoff, J. H. Bruning and R. L. Johnston

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201613

    12. Polydiallylorthophthalate resist for electron-beam lithography (pages 1110–1114)

      Y. Yoneda, K. Kitamura, J. Naito, T. Kitakohji, H. Okuyama and K. Murakawa

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760201614

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