Polymer Engineering & Science

Cover image for Polymer Engineering & Science

July 1989

Volume 29, Issue 13

Pages fmi–fmi, 845–894

  1. Masthead

    1. Top of page
    2. Masthead
    3. Articles
    1. Masthead (page fmi)

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291301

  2. Articles

    1. Top of page
    2. Masthead
    3. Articles
    1. Guest editor's message (page 845)

      Maung S. Htoo

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291302

    2. Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography (pages 850–855)

      R. G. Tarascon, E. Reichmanis, F. M. Houlihan, A. Shugard and L. F. Thompson

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291304

    3. A novel positive resist for deep UV lithography (pages 856–858)

      Tsuguo Yamaoka, Masashi Nishiki, Ken'Ichi Koseki and Mitsunobu Koshiba

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291305

    4. Novel positive deep UV resist for KrF excimer laser lithography (pages 859–862)

      Masayuki Endo, Yoshiyuki Tani, Masaru Sasago, Kazufumi Ogawa and Noboru Nomura

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291306

    5. Positive excimer laser resists prepared with aliphatic diazoketones (pages 863–867)

      Hisashi Sugiyama, Keisuke Ebata, Akiko Mizushima and Kazuo Nate

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291307

    6. A negative resist for KrF excimer laser lithography (pages 868–873)

      M. Toriumi, N. Hayashi, M. Hashimoto, S. Nonogaki, T. Ueno and T. Iwayanagi

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291308

    7. Highly sensitive novolak-based X-ray positive resist (pages 874–877)

      J. Lingnau, R. Dammel and J. Theis

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291309

    8. Polysilanes: Photochemistry and deep UV lithography (pages 882–886)

      R. D. Miller, G. Wallraff, N. Clecak, R. Sooriyakumaran, J. Michl, T. Karatsu, A. J. McKinley, K. A. Klingensmith and J. Downing

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291311

    9. Application of silicon polymer as positive photosensitive material (pages 887–890)

      Toshiaki Aoai, Akira Umehara, Akihiko Kamiya, Nobuaki Matsuda and Yoshimasa Aotani

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291312

    10. Silicon containing photoresists for half micron lithography (pages 891–894)

      R. Sezi, M. Sebald and R. Leuschner

      Article first published online: 25 AUG 2004 | DOI: 10.1002/pen.760291313

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