Polymer Engineering & Science

Cover image for Polymer Engineering & Science

August 1989

Volume 29, Issue 14

Pages fmi–fmi, 897–971

  1. Masthead

    1. Top of page
    2. Masthead
    3. Articles
    1. You have free access to this content
      Masthead (page fmi)

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291401

  2. Articles

    1. Top of page
    2. Masthead
    3. Articles
    1. Guest editor's message (page 897)

      Maung S. Htoo

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291402

    2. Water-Soluble contrast enhancing materials—new photobleachable dyes (pages 898–901)

      T. Yonezawa, H. Kikuchi, K. Hayashi, N. Tochizawa, N. Endo, S. Fukuzawa, S. Sugito and K. Ichimura

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291403

    3. A new contrast enhanced lithography (cel) process using “chinese rosin” as a binder (pages 902–906)

      Yoichi Tomo, Hideyuki Jinbo, Yoshio Yamashita, Seigo Ohno, Takateru Asano, Satoshi Nishibu and Hiroshi Umehara

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291404

    4. Epoxy resins for deep UV lithography (pages 907–910)

      K. J. Stewart, M. Hatzakis and J. M. Shaw

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291405

    5. Photochemical free-volume generation in poly(methyl methacrylate) photoresists (pages 911–915)

      William Limm, Mitchell A. Winnik and Barton A. Smith

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291406

    6. Dissolution inhibition mechanisms of naphthoquinone diazides (pages 916–919)

      Mitsunobu Koshiba, Makoto Murata, Yoshiyuki Harita and Tsuguo Yamaoka

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291407

    7. A sub-0.5 μm bilevel lithographic process using the deep-UV electron-beam resist p(si-cms) (pages 920–927)

      A. E. Novembre, M. J. Jurek, A. Kornblit and E. Reichmanis

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291408

    8. The chemistry of g-line photoresist processes (pages 928–936)

      F. A. Vollenbroek, W. P. M. Nijssen, C. M. J. Mutsaers, M. J. H. J. Geomini, M. E. Reuhman and R. J. Visser

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291409

    9. Poly(Aryline imides) as E-beam resist: Sensitivity and resolution (pages 937–941)

      James C. W. Chien and B. M. Gong

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291410

    10. The mechanism of photocure of inherently photosensitive polyimides containing a benzophenone group (pages 942–944)

      J. C. Scaiano, J. C. Netto-Ferreira, A. F. Becknell and R. D. Small

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291411

    11. Synthesis and characterization of positive photosensitive polyimide precursors (pages 950–953)

      Shigeru Kubota, Youko Yamawaki, Toshimoto Moriwaki and Shohei Eto

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291413

    12. Novel photoresist design based on electrophilic aromatic substitution (pages 960–964)

      B. Reck, R. D. Allen, R. J. Twieg, C. G. Willson, S. Matuszczak, H. D. H. Stover, N. H. Li and J. M. J. Fréchet

      Version of Record online: 25 AUG 2004 | DOI: 10.1002/pen.760291415

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