Polymer Engineering & Science

Cover image for Polymer Engineering & Science

November 1992

Volume 32, Issue 21

Pages fmi–fmi, 1557–1652

  1. Masthead

    1. Top of page
    2. Masthead
    3. Preamble
    4. Articles
    1. Masthead (page fmi)

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322101

  2. Preamble

    1. Top of page
    2. Masthead
    3. Preamble
    4. Articles
    1. Preamble (page 1557)

      Maung S. Htoo

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322102

  3. Articles

    1. Top of page
    2. Masthead
    3. Preamble
    4. Articles
    1. Progress in deep-UV resists using CARL technology (pages 1558–1564)

      R. Leuschner, H. Borndörfer, E. Kühn, M. Sebald, R. Sezi, M. Byer and Ch. Nölscher

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322103

    2. Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study (pages 1565–1570)

      O. Nalamasu, E. Reichmanis, J. E. Hanson, R. S. Kanga, L. A. Heimbrook, A. B. Emerson, F. A. Baiocchi and S. Vaidya

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322104

    3. A novel chemically amplified positive deep UV photoresist with significantly reduced sensitivity to environmental contamination (pages 1571–1577)

      Subhankar Chatterjee, Sangya Jain, Ping H. Lu, Dinesh N. Khanna, Robert E. Potvin, James A. McCaulley and Joseph Rafalko

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322105

    4. Anti-reflective coating for deep UV lithography process enhancement (pages 1578–1582)

      Gregg A. Barnes, Tony D. Flaim, Susan K. Jones, Bruce W. Dudley, David A. Koester, Charles R. Peters and Stephen M. Bobbio

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322106

    5. Aerial image formation with a KrF excimer laser stepper (pages 1583–1588)

      M. E. Preil and W. H. Arnold

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322107

    6. The thermal deprotection process in an e-beam exposed phenolic-based polymer (pages 1589–1594)

      Treva Long, S. Kay Obendorf and Ferdinand Rodriguez

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322108

    7. Selected equipment, materials, and process interactions in a surface-imaging process (pages 1600–1604)

      César M. Garza, Eric J. Solowiej and Mark A. Boehm

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322110

    8. Direct patterning using metallo-organics and its application to mask repair (pages 1605–1609)

      Satoshi Takechi and Naomichi Abe

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322111

    9. A photosensitive polyimide using an alkaline aqueous solution as a developer (pages 1610–1612)

      Hiroshi Nishizawa, Kuniaki Sato, Mitsumasa Kojima and Hidetaka Satou

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322112

    10. Synthesis and characterization of a low stress photosensitive polyimide (pages 1613–1617)

      Allan E. Nader, Kazunori Imai, John D. Craig, Christina N. Lazaridis, Daniel O. Murray III, Michael T. Pottiger, Stephen A. Dombchik and William J. Lautenberger

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322113

    11. Ester-type photosensitive polyimide precursor with low thermal expansion coefficient (pages 1618–1622)

      Y. Matsuoka, K. Yokota, S. Ogitani, A. Ikeda, H. Takahashi and H. Ai

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322114

    12. Novel auto-photosensitive polyimides with tailored properties (pages 1623–1629)

      Ottmar Rohde, Paul Smolka, Pasquale A. Falcigno and Josef Pfeifer

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322115

    13. Photosensitive polyimidesiloxanes (pages 1630–1633)

      J.-O. Choi, J. C. Rosenfeld, J. A. Tyrell, J. H. Yang, S. R. Rojstaczer and S. Jeng

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322116

    14. Intrinsically photosensitive polyimides: Approaches to fluorinated homologs (pages 1642–1645)

      J. A. Moore and Donald R. Gamble

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322118

    15. Pre-imidized photoimageable polyimide as a dielectric for high density multichip modules (pages 1646–1652)

      Jay M. Cech, Andrew F. Burnett and Lisa Knapp

      Article first published online: 26 AUG 2004 | DOI: 10.1002/pen.760322119

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