Deposition of intrinsic hydrogenated amorphous silicon for thin-film solar cells – a comparative study for layers grown statically by RF-PECVD and dynamically by VHF-PECVD
Article first published online: 31 JUL 2012
Copyright © 2012 John Wiley & Sons, Ltd.
Progress in Photovoltaics: Research and Applications
Volume 22, Issue 2, pages 198–207, February 2014
How to Cite
Zimmermann, T., Flikweert, A. J., Merdzhanova, T., Woerdenweber, J., Gordijn, A., Rau, U., Stahr, F., Dybek, K. and Bartha, J. W. (2014), Deposition of intrinsic hydrogenated amorphous silicon for thin-film solar cells – a comparative study for layers grown statically by RF-PECVD and dynamically by VHF-PECVD. Prog. Photovolt: Res. Appl., 22: 198–207. doi: 10.1002/pip.2254
- Issue published online: 18 JAN 2014
- Article first published online: 31 JUL 2012
- Manuscript Accepted: 9 MAY 2012
- Manuscript Revised: 4 MAY 2012
- Manuscript Received: 1 FEB 2012
- German Federal Ministry for the Environment, Nature Conservation and Nuclear Safety. Grant Number: 0327625 and 0325024A
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