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High-speed atmospheric atomic layer deposition of ultra thin amorphous TiO2 blocking layers at 100 °C for inverted bulk heterojunction solar cells

Authors


Correspondence: David Muñoz-Rojas, Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, UK.

E-mail: davidmunozrojas@gmail.com

ABSTRACT

Ultrafast, spatial atmospheric atomic layer deposition, which does not involve vacuum steps and is compatible with roll-to-roll processing, is used to grow high quality TiO2 blocking layers for organic solar cells. Dense, uniform thin TiO2 films are grown at temperatures as low as 100 °C in only 37 s (~20 nm/min growth rate). Incorporation of these films in P3HT-PCBM-based solar cells shows performances comparable with cells made using TiO2 films deposited with much longer processing times and/or higher temperatures. Copyright © 2013 John Wiley & Sons, Ltd.

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