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Comparative study of ZnO thin films prepared by plasma deposition and electron beam evaporation for use in photovoltaic devices

Authors

  • V. D. Falcão,

    Corresponding author
    1. Instituto Federal de Educação Ciência e Tecnologia de Minas Gerais – IFMG Campus Congonhas, Congonhas/MG, Brazil
    2. Rede Temática em Engenharia de Materiais – REDEMAT, Ouro Preto/MG, Brazil
    • Instituto Federal de Educação, Ciência e Tecnologia de Minas Gerais – IFMG Campus Congonhas, Congonhas/MG, Brazil.
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  • D. O. Miranda,

    1. Rede Temática em Engenharia de Materiais – REDEMAT, Ouro Preto/MG, Brazil
    2. Fundação Centro Tecnológico de Minas Gerais – CETEC, Belo Horizonte/MG, Brazil
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  • M. E. L. Sabino,

    1. Rede Temática em Engenharia de Materiais – REDEMAT, Ouro Preto/MG, Brazil
    2. Fundação Centro Tecnológico de Minas Gerais – CETEC, Belo Horizonte/MG, Brazil
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  • T. D. O. Moura,

    1. Rede Temática em Engenharia de Materiais – REDEMAT, Ouro Preto/MG, Brazil
    2. Fundação Centro Tecnológico de Minas Gerais – CETEC, Belo Horizonte/MG, Brazil
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  • A. S. A. C Diniz,

    1. Companhia Energética de Minas Gerais – CEMIG, Belo Horizonte/MG, Brazil
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  • L. R. Cruz,

    1. Instituto Militar de Engenharia - IME, Rio de Janeiro/RJ, Brazil
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  • J. R. T. Branco

    1. Rede Temática em Engenharia de Materiais – REDEMAT, Ouro Preto/MG, Brazil
    2. Fundação Centro Tecnológico de Minas Gerais – CETEC, Belo Horizonte/MG, Brazil
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Abstract

Undoped zinc oxide thin films were grown at room temperature using two techniques: plasma deposition (PD) and electron beam evaporation in an argon atmosphere. PD offers some advantages, such as low ion damage and low deposition temperature. The optical transmittance of the films deposited by both methods was higher than 80% in the near UV–VIS range; the energy band gap and index of refraction agree with values reported in the literature. The resistivity of films grown by PD was 3.1 × 10−2 Ω cm, lower than the value of 1.2 × 10−1 Ω cm found for plasma assisted e-beam evaporated films. Copyright © 2010 John Wiley & Sons, Ltd.

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