Laser-fired contact optimization in c-Si solar cells (pages 173–180)
P. Ortega, A. Orpella, I. Martín, M. Colina, G. López, C. Voz, M. I. Sánchez, C. Molpeceres and R. Alcubilla
Version of Record online: 15 APR 2011 | DOI: 10.1002/pip.1115
This work studies the optimization of laser-fired contact (LFC) processing parameters. LFC process has been made through four passivation layers that are typically used in c-Si and mc-Si solar cell fabrication: thermal silicon oxide (SiO2), deposited phosphorus-doped amorphous silicon carbide (a-SiCx:H(n)), aluminum oxide (Al2O3) and silicon nitride (SiNx:H) films. Values for the LFC resistance normalized by the laser spot area in the range of 0.65-3mΩcm2 have been obtained.