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Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates

  1. Erik W. Edwards1,
  2. Mark P. Stoykovich1,
  3. Marcus Müller2,
  4. Harun H. Solak3,
  5. Juan J. de Pablo1,
  6. Paul F. Nealey1,*

Article first published online: 24 OCT 2005

DOI: 10.1002/polb.20643

Issue

Journal of Polymer Science Part B: Polymer Physics

Journal of Polymer Science Part B: Polymer Physics

Special Issue: The American Physical Society Division of Polymer Physics Special Issue

Volume 43, Issue 23, pages 3444–3459, 1 December 2005

Additional Information

How to Cite

Edwards, E. W., Stoykovich, M. P., Müller, M., Solak, H. H., de Pablo, J. J. and Nealey, P. F. (2005), Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates. Journal of Polymer Science Part B: Polymer Physics, 43: 3444–3459. doi: 10.1002/polb.20643

Author Information

  1. 1

    Department of Chemical and Biological Engineering and Center for Nanotechnology,University of Wisconsin-Madison, Madison, Wisconsin 53706

  2. 2

    Department of Physics, University of Wisconsin-Madison, Madison, Wisconsin 53706

  3. 3

    Laboratory for Micro and Nanotechnology, Paul Scherrer Institut, CH-5232, Villigen, Switzerland

*Department of Chemical and Biological Engineering and Center for Nanotechnology,University of Wisconsin-Madison, Madison, Wisconsin 53706

Publication History

  1. Issue published online: 24 OCT 2005
  2. Article first published online: 24 OCT 2005
  3. Manuscript Accepted: 28 JUL 2005
  4. Manuscript Revised: 21 JUL 2005
  5. Manuscript Received: 13 MAY 2005

Funded by

  • Semiconductor Research Corp. (SRC). Grant Number: 2002-MJ-985
  • National Science Foundation through the Nanoscale Science and Engineering Center. Grant Number: DMR-0425880
  • Camille Dreyfus Teacher-Scholar Award
  • NSF. Grant Number: DMR-0084402

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Keywords:

  • annealing;
  • diblock copolymers;
  • directed assembly;
  • lithography;
  • thin films

Abstract

Lamellae forming diblock copolymer domains can be directed to assemble without defects and in registration with chemically nanopatterned substrates. Initially, thin films of the lamellar poly(styrene-b-methyl methacrylate) block copolymer form hexagonally close-packed styrene domains when annealed on chemical nanopatterned striped surfaces. These styrene domains then coalesce to form linear styrene domains that are not fully registered with the underlying chemical surface pattern. Defects coarsen, until defect-free directed assembly is obtained, by breaking linear styrene domains and reforming new structures until registered lamellae have been formed. At all stages in the process, two factors play an important role in the observed degree of registration of the block copolymer domains as a function of annealing time: the interfacial energy between the blocks of the copolymer and the chemically nanopatterned substrate and the commensurability of the bulk repeat period of the block copolymer and the substrate pattern period. Insight into the time-dependent three-dimensional behavior of the block copolymer structures is gained from single chain in mean field simulations. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 3444–3459, 2005

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