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Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates

Erik W. Edwards¹,
Mark P. Stoykovich¹,
Marcus Müller²,
Harun H. Solak³,
Juan J. de Pablo¹,
Paul F. Nealey^1,*

Article first published online: 24 OCT 2005

DOI: 10.1002/polb.20643

Issue

Journal of Polymer Science Part B: Polymer Physics

Special Issue: The American Physical Society Division of Polymer Physics Special Issue

Volume 43, Issue 23, pages 3444–3459, 1 December 2005

Additional Information

How to Cite

Edwards, E. W., Stoykovich, M. P., Müller, M., Solak, H. H., de Pablo, J. J. and Nealey, P. F. (2005), Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates. J. Polym. Sci. B Polym. Phys., 43: 3444–3459. doi: 10.1002/polb.20643

Author Information

¹
Department of Chemical and Biological Engineering and Center for Nanotechnology,University of Wisconsin-Madison, Madison, Wisconsin 53706
²
Department of Physics, University of Wisconsin-Madison, Madison, Wisconsin 53706
³
Laboratory for Micro and Nanotechnology, Paul Scherrer Institut, CH-5232, Villigen, Switzerland

Email: Paul F. Nealey (nealey@engr.wisc.edu)

^*Department of Chemical and Biological Engineering and Center for Nanotechnology,University of Wisconsin-Madison, Madison, Wisconsin 53706

Publication History

Issue published online: 24 OCT 2005
Article first published online: 24 OCT 2005
Manuscript Accepted: 28 JUL 2005
Manuscript Revised: 21 JUL 2005
Manuscript Received: 13 MAY 2005

Funded by

Semiconductor Research Corp. (SRC). Grant Number: 2002-MJ-985
National Science Foundation through the Nanoscale Science and Engineering Center. Grant Number: DMR-0425880
Camille Dreyfus Teacher-Scholar Award
NSF. Grant Number: DMR-0084402

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The SEM image for the block copolymer domains annealed on an L_S = 42.5 nm patterned polystyrene brush contains many regions that do not exhibit the hexagonally close-packed styrene domains. We hypothesize that these occur because the chemical surface pattern that was generated at the substrate was not uniform for this sample and contained some small regions where the photoresist was completely removed during exposure/development resulting in a uniform, oxygenated polystyrene brush.
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Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates

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Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates

Journal of Polymer Science Part B: Polymer Physics

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