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Advances in square arrays through self-assembly and directed self-assembly of block copolymers

  1. Christopher G. Hardy,
  2. Chuanbing Tang*

Article first published online: 26 SEP 2012

DOI: 10.1002/polb.23174

Issue

Journal of Polymer Science Part B: Polymer Physics

Journal of Polymer Science Part B: Polymer Physics

Volume 51, Issue 1, pages 2–15, 1 January 2013

Additional Information

How to Cite

Hardy, C. G. and Tang, C. (2013), Advances in square arrays through self-assembly and directed self-assembly of block copolymers. J. Polym. Sci. B Polym. Phys., 51: 2–15. doi: 10.1002/polb.23174

Author Information

  1. Department of Chemistry and Biochemistry, University of South Carolina, Columbia, South Carolina 29208

*Department of Chemistry and Biochemistry, University of South Carolina, Columbia, South Carolina 29208

Publication History

  1. Issue published online: 27 NOV 2012
  2. Article first published online: 26 SEP 2012
  3. Manuscript Accepted: 27 AUG 2012
  4. Manuscript Received: 23 JUL 2012

Funded by

  • University of South Carolina
  • Global Research Collaboration Program of Semiconductor Research Corporation

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Keywords:

  • block copolymers;
  • lithography;
  • self-assembly

Abstract

This review covers recent advances in developing square arrays in thin films using block copolymers. Theoretical and experimental results from self-assembly of block copolymers in bulk and thin films, directed self-assembly of block copolymers confined in small wells, on substrates with arrays of posts, and on chemically nanopatterned substrates, as well as applications as nanolithography are reviewed. Some future work and hypothesis are discussed. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2013

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