Cover Image, Volume 51, Issue 1


original image

Nanometer-scaled square arrays of block copolymers are of particular interest to the electronics industry because they are more compatible with semiconductor integrated circuit design standards based on a rectilinear system. However, they are more difficult to achieve due to the unique demands the geometry places on polymer compositions and chemistry. On page 2, Christopher G. Hardy and Chuanbing Tang review recent advances in the development of square arrays of block copolymers by self-assembly and directed selfassembly. Applications in nanolithography and future directions are discussed.