Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure

Authors

  • Pierre-Luc Girard-Lauriault,

    1. Groupe de Recherche en Physique et Technologie des Couches Minces (GCM) and Department of Engineering Physics, École Polytechnique de Montréal, P. O. Box 6079, Station Centre-Ville, Montréal, Québec H3C 3A7, Canada
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  • Patrick Desjardins,

    1. Groupe de Recherche en Physique et Technologie des Couches Minces (GCM) and Department of Engineering Physics, École Polytechnique de Montréal, P. O. Box 6079, Station Centre-Ville, Montréal, Québec H3C 3A7, Canada
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  • Wolfgang E. S. Unger,

    Corresponding author
    1. Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 44–46, D-12203 Berlin, Germany
    • Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 44–46, D-12203 Berlin, Germany. Fax: +49 30 8104 1827
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  • Andreas Lippitz,

    1. Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 44–46, D-12203 Berlin, Germany
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  • Michael R. Wertheimer

    Corresponding author
    1. Groupe de Recherche en Physique et Technologie des Couches Minces (GCM) and Department of Engineering Physics, École Polytechnique de Montréal, P. O. Box 6079, Station Centre-Ville, Montréal, Québec H3C 3A7, Canada
    • Groupe de Recherche en Physique et Technologie des Couches Minces (GCM) and Department of Engineering Physics, École Polytechnique de Montréal, P. O. Box 6079, Station Centre-Ville, Montréal, Québec H3C 3A7, Canada. Fax: +1 514 340 3218
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Abstract

We have used an atmospheric pressure DBD apparatus to deposit novel families of N-rich plasma polymers (PP:N), using mixtures of three different hydrocarbon precursors in nitrogen at varying respective gas flow ratios. This research focuses on the overall chemical characterisation of those materials, with specific attention to (semi)-quantitative analysis of functional groups. Well-established and some lesser-known analytical techniques have been combined to provide the best possible chemical and structural characterisations of these three families of PP:N thin films, namely XPS, NEXAFS and FT-IR spectroscopy.

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