Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure
Article first published online: 31 JUL 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Plasma Processes and Polymers
Volume 5, Issue 7, pages 631–644, September 15, 2008
How to Cite
Girard-Lauriault, P.-L., Desjardins, P., Unger, W. E. S., Lippitz, A. and Wertheimer, M. R. (2008), Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure. Plasma Processes Polym., 5: 631–644. doi: 10.1002/ppap.200800054
- Issue published online: 3 SEP 2008
- Article first published online: 31 JUL 2008
- Manuscript Accepted: 3 JUN 2008
- Manuscript Revised: 30 MAY 2008
- Manuscript Received: 10 MAR 2008
- Natural Sciences and Engineering Research Council of Canada (NSERC)
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